chemical mechanical polishing process Latest Research Papers

Flatness on-machine measurement system of chemical mechanical polishing process for large-caliber tin plates

Optical Engineering ◽

10.1117/1.oe.60.12.124103 ◽

2021 ◽

Vol 60 (12) ◽

Author(s):

Chupeng Zhang ◽

Zhenghao Deng ◽

Shijie Zhao ◽

Linxiao Yang ◽

Xiuhong Li

Keyword(s):

Measurement System ◽

Chemical Mechanical Polishing ◽

Mechanical Polishing ◽

Polishing Process ◽

Chemical Mechanical Polishing Process

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Development of Particle Detecting Technology for Measurement Slurry Particle Property in Chemical Mechanical Polishing Process

ECS Meeting Abstracts ◽

10.1149/ma2021-0120830mtgabs ◽

2021 ◽

Vol MA2021-01 (20) ◽

pp. 830-830

Author(s):

Chang min Kim ◽

Kihong Park ◽

Sanghcuk Jeon ◽

Taesung Kim

Keyword(s):

Chemical Mechanical Polishing ◽

Mechanical Polishing ◽

Polishing Process ◽

Chemical Mechanical Polishing Process ◽

Particle Property

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First-principles molecular dynamics investigation of ceria/silica sliding interface toward functional materials design for chemical mechanical polishing process

Applied Surface Science ◽

10.1016/j.apsusc.2020.147259 ◽

2020 ◽

Vol 530 ◽

pp. 147259 ◽

Cited By ~ 2

Author(s):

Tasuku Onodera ◽

Hitomi Takahashi ◽

Satoyuki Nomura

Keyword(s):

Molecular Dynamics ◽

First Principles ◽

Chemical Mechanical Polishing ◽

Functional Materials ◽

Materials Design ◽

Mechanical Polishing ◽

Polishing Process ◽

Sliding Interface ◽

Chemical Mechanical Polishing Process ◽

First Principles Molecular Dynamics

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Insight into the mechanism of low friction and wear during the chemical mechanical polishing process of diamond: A reactive molecular dynamics simulation

Tribology International ◽

10.1016/j.triboint.2020.106308 ◽

2020 ◽

Vol 148 ◽

pp. 106308

Author(s):

Song Yuan ◽

Xiaoguang Guo ◽

Junxin Huang ◽

Yonjun Gou ◽

Zhuji Jin ◽

...

Keyword(s):

Molecular Dynamics ◽

Molecular Dynamics Simulation ◽

Chemical Mechanical Polishing ◽

Friction And Wear ◽

Dynamics Simulation ◽

Low Friction ◽

Polishing Process ◽

Reactive Molecular Dynamics ◽

Chemical Mechanical Polishing Process ◽

Insight Into

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Run-to-Run Control of Chemical Mechanical Polishing Process Based on Deep Reinforcement Learning

IEEE Transactions on Semiconductor Manufacturing ◽

10.1109/tsm.2020.3002896 ◽

2020 ◽

Vol 33 (3) ◽

pp. 454-465

Author(s):

Jianbo Yu ◽

Peng Guo

Keyword(s):

Reinforcement Learning ◽

Chemical Mechanical Polishing ◽

Mechanical Polishing ◽

Polishing Process ◽

Chemical Mechanical Polishing Process

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3-D Modeling of Wafer Topography's Effect on Chemical Mechanical Polishing Process

ECS Transactions ◽

10.1149/1.3204411 ◽

2019 ◽

Vol 25 (3) ◽

pp. 233-241

Author(s):

Lixiao Wu ◽

Changfeng Yan

Keyword(s):

Chemical Mechanical Polishing ◽

Mechanical Polishing ◽

Polishing Process ◽

Chemical Mechanical Polishing Process

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An Analytical Model of Contact Pressure Caused by 2-D Wafer Topography in Chemical-Mechanical Polishing Process

ECS Transactions ◽

10.1149/1.3694378 ◽

2019 ◽

Vol 44 (1) ◽

pp. 621-628

Author(s):

Lixiao Wu

Keyword(s):

Contact Pressure ◽

Analytical Model ◽

Chemical Mechanical Polishing ◽

Mechanical Polishing ◽

Polishing Process ◽

Chemical Mechanical Polishing Process

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Grinding and chemical mechanical polishing process for micropore x-ray optics fabricated with deep reactive ion etching

Applied Optics ◽

10.1364/ao.58.005240 ◽

2019 ◽

Vol 58 (19) ◽

pp. 5240 ◽

Cited By ~ 1

Author(s):

Aoto Fukushima ◽

Maiko Fujitani ◽

Kumi Ishikawa ◽

Masaki Numazawa ◽

Daiki Ishi ◽

...

Keyword(s):

Chemical Mechanical Polishing ◽

Reactive Ion Etching ◽

Mechanical Polishing ◽

Polishing Process ◽

Ion Etching ◽

Ray Optics ◽

Deep Reactive Ion Etching ◽

X Ray ◽

Chemical Mechanical Polishing Process

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Flatness maintenance and roughness reduction of silicon mirror in chemical mechanical polishing process

Science China Technological Sciences ◽

10.1007/s11431-018-9414-6 ◽

2019 ◽

Vol 63 (1) ◽

pp. 166-172 ◽

Cited By ~ 2

Author(s):

BoCheng Jiang ◽

DeWen Zhao ◽

BingQuan Wang ◽

HuiJia Zhao ◽

YuHong Liu ◽

...

Keyword(s):

Chemical Mechanical Polishing ◽

Mechanical Polishing ◽

Polishing Process ◽

Chemical Mechanical Polishing Process

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Investigation of effects of pattern structures arrangement on chemical mechanical polishing process

2018 China Semiconductor Technology International Conference (CSTIC) ◽

10.1109/cstic.2018.8369259 ◽

2018 ◽

Author(s):

Lixiao Wu ◽

Sookap Hahn ◽

Changfeng Yan

Keyword(s):

Chemical Mechanical Polishing ◽

Mechanical Polishing ◽

Polishing Process ◽

Pattern Structures ◽

Chemical Mechanical Polishing Process

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chemical mechanical polishing process
Recently Published Documents

TOTAL DOCUMENTS

H-INDEX

Flatness on-machine measurement system of chemical mechanical polishing process for large-caliber tin plates

Development of Particle Detecting Technology for Measurement Slurry Particle Property in Chemical Mechanical Polishing Process

First-principles molecular dynamics investigation of ceria/silica sliding interface toward functional materials design for chemical mechanical polishing process

Insight into the mechanism of low friction and wear during the chemical mechanical polishing process of diamond: A reactive molecular dynamics simulation

Run-to-Run Control of Chemical Mechanical Polishing Process Based on Deep Reinforcement Learning

3-D Modeling of Wafer Topography's Effect on Chemical Mechanical Polishing Process

An Analytical Model of Contact Pressure Caused by 2-D Wafer Topography in Chemical-Mechanical Polishing Process

Grinding and chemical mechanical polishing process for micropore x-ray optics fabricated with deep reactive ion etching

Flatness maintenance and roughness reduction of silicon mirror in chemical mechanical polishing process

Investigation of effects of pattern structures arrangement on chemical mechanical polishing process

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chemical mechanical polishing processRecently Published Documents

TOTAL DOCUMENTS

H-INDEX

Flatness on-machine measurement system of chemical mechanical polishing process for large-caliber tin plates

Development of Particle Detecting Technology for Measurement Slurry Particle Property in Chemical Mechanical Polishing Process

First-principles molecular dynamics investigation of ceria/silica sliding interface toward functional materials design for chemical mechanical polishing process

Insight into the mechanism of low friction and wear during the chemical mechanical polishing process of diamond: A reactive molecular dynamics simulation

Run-to-Run Control of Chemical Mechanical Polishing Process Based on Deep Reinforcement Learning

3-D Modeling of Wafer Topography's Effect on Chemical Mechanical Polishing Process

An Analytical Model of Contact Pressure Caused by 2-D Wafer Topography in Chemical-Mechanical Polishing Process

Grinding and chemical mechanical polishing process for micropore x-ray optics fabricated with deep reactive ion etching

Flatness maintenance and roughness reduction of silicon mirror in chemical mechanical polishing process

Investigation of effects of pattern structures arrangement on chemical mechanical polishing process

chemical mechanical polishing process
Recently Published Documents