Delay-time stable chemically amplified deep-UV resist

1993 ◽  
Author(s):  
Klaus J. Przybilla ◽  
Yoshiaki Kinoshita ◽  
Takanori Kudo ◽  
Seiya Masuda ◽  
Hiroshi Okazaki ◽  
...  
Keyword(s):  
Delay Time ◽  
Chemically Amplified ◽  
Deep Uv

Comparison of the lithographic characteristics of t-BOC-based chemically amplified resist system under deep-UV and electron-beam exposures

1994 ◽  
Author(s):  
Regine G. Tarascon-Auriol ◽  
Anthony E. Novembre ◽  
Woon W. Tai ◽  
Linus A. Fetter ◽  
Janet M. Kometani ◽  
...  
Keyword(s):  
Electron Beam ◽  
Chemically Amplified ◽  
Chemically Amplified Resist ◽  
Deep Uv

Quarter- and subquarter-micron deep-UV lithography with chemically amplified positive resist

1996 ◽  
Author(s):  
Yasunobu Onishi ◽  
Kazuo Sato ◽  
Kenzi Chiba ◽  
Masafumi Asano ◽  
Hirokazu Niki ◽  
...  
Keyword(s):  
Uv Lithography ◽  
Chemically Amplified ◽  
Deep Uv ◽  
Positive Resist

A novel chemically amplified positive deep UV photoresist with significantly reduced sensitivity to environmental contamination

1992 ◽  
Vol 32 (21) ◽  
pp. 1571-1577 ◽  
Author(s):  
Subhankar Chatterjee ◽  
Sangya Jain ◽  
Ping H. Lu ◽  
Dinesh N. Khanna ◽  
Robert E. Potvin ◽  
...  
Keyword(s):  
Environmental Contamination ◽  
Chemically Amplified ◽  
Deep Uv

Deep-UV positive-tone dry-development process using chemically amplified resist and its application to 256 Mbit DRAM

1993 ◽  
Author(s):  
Woo-Sung Han ◽  
Joong-Hyun Lee ◽  
Jung-Chul Park ◽  
Choon-Geun Park ◽  
Hoyoung Kang ◽  
...  
Keyword(s):  
Development Process ◽  
Chemically Amplified ◽  
Chemically Amplified Resist ◽  
Deep Uv

Dry lithography of chemically amplified acid-catalyzed deep-UV and e-beam resist

1993 ◽  
Author(s):  
Yosef Y. Shacham-Diamand ◽  
Clency Lee-Yow ◽  
Jean M. J. Frechet ◽  
S. Ming Lee
Keyword(s):  
Chemically Amplified ◽  
Acid Catalyzed ◽  
Deep Uv

Evaluation of a new environmentally stable positive tone chemically amplified deep-UV resist

1994 ◽  
Author(s):  
Wu-Song Huang ◽  
Ranee W. Kwong ◽  
Ahmad D. Katnani ◽  
Mahmoud Khojasteh
Keyword(s):  
Chemically Amplified ◽  
Deep Uv

Application of photodecomposable base concept to two-component deep-UV chemically amplified resists

1996 ◽  
Author(s):  
Satoru Funato ◽  
N. Kawasaki ◽  
Yoshiaki Kinoshita ◽  
Seiya Masuda ◽  
Hiroshi Okazaki ◽  
...  
Keyword(s):  
Chemically Amplified ◽  
Base Concept ◽  
Two Component ◽  
Deep Uv ◽  
Chemically Amplified Resists

Poly(t-BOC-styrene sulfone)-based chemically amplified resists for deep-UV lithography

1989 ◽  
Vol 29 (13) ◽  
pp. 850-855 ◽  
Author(s):  
R. G. Tarascon ◽  
E. Reichmanis ◽  
F. M. Houlihan ◽  
A. Shugard ◽  
L. F. Thompson
Keyword(s):  
Uv Lithography ◽  
Chemically Amplified ◽  
Deep Uv ◽  
Chemically Amplified Resists
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