Alpha-hydroxymethlbenzoin sulfonic acid esters--a versatile class of photoacid generating compounds for chemically amplified deep-UV photoresists

1993 ◽  
Author(s):  
Horst Roeschert ◽  
Charlotte Eckes ◽  
Georg Pawlowski
Keyword(s):  
Sulfonic Acid ◽  
Chemically Amplified ◽  
Deep Uv ◽  
Acid Esters

scholarly journals Studies on Cancerocidal Substances. XVI. Some Sulfonic Acid Esters as Anti-cancer Agents.

1957 ◽  
Vol 5 (3) ◽  
pp. 203-207 ◽  
Author(s):  
Morizo Ishidate ◽  
Yoshio Sakurai ◽  
Sakahiko Owari
Keyword(s):  
Sulfonic Acid ◽  
Anti Cancer ◽  
Acid Esters

Hydrolysis of Sulfonic Acid Esters

2008 ◽  
pp. 1
Author(s):  
J. Drabowicz ◽  
P. Kiełbasiński ◽  
P. Łyżwa ◽  
A. Zając ◽  
M. Mikołajczyk
Keyword(s):  
Sulfonic Acid ◽  
Hydrolysis Of ◽  
Acid Esters

ChemInform Abstract: A New Photochemical Reaction of Sulfonic Acid Esters.

ChemInform ◽  
2010 ◽  
Vol 26 (52) ◽  
pp. no-no
Author(s):  
S. DUAN ◽  
E. R. BINKLEY ◽  
R. W. BINKLEY
Keyword(s):  
Photochemical Reaction ◽  
Sulfonic Acid ◽  
Acid Esters

Photochemical Non-Reciprocity Behaviour of New 1,2-Naphthoquinone-Diazide-2-(4)- Sulfonic Acid Esters

1994 ◽  
Vol 253 (1) ◽  
pp. 151-159
Author(s):  
Erika Sauer ◽  
Jürgen Bendig ◽  
Simone Zoladz
Keyword(s):  
Sulfonic Acid ◽  
Acid Esters

Carcinostatic Sulfonic Acid Esters of Butyne-and Butane-1,4-diols1a,b

1966 ◽  
Vol 9 (5) ◽  
pp. 776-778 ◽  
Author(s):  
Robert A. Earl ◽  
Robert E. Harmon
Keyword(s):  
Sulfonic Acid ◽  
Acid Esters

Comparison of the lithographic characteristics of t-BOC-based chemically amplified resist system under deep-UV and electron-beam exposures

1994 ◽  
Author(s):  
Regine G. Tarascon-Auriol ◽  
Anthony E. Novembre ◽  
Woon W. Tai ◽  
Linus A. Fetter ◽  
Janet M. Kometani ◽  
...  
Keyword(s):  
Electron Beam ◽  
Chemically Amplified ◽  
Chemically Amplified Resist ◽  
Deep Uv

Quarter- and subquarter-micron deep-UV lithography with chemically amplified positive resist

1996 ◽  
Author(s):  
Yasunobu Onishi ◽  
Kazuo Sato ◽  
Kenzi Chiba ◽  
Masafumi Asano ◽  
Hirokazu Niki ◽  
...  
Keyword(s):  
Uv Lithography ◽  
Chemically Amplified ◽  
Deep Uv ◽  
Positive Resist
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