ACS Symposium Series - Polymers for Microelectronics
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0841227217, 0841213933
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Synthesis of 4-(tert-Butoxycarbonyl)-2,6-dinitrobenzyl Tosylate

1993 ◽  
pp. 25-39
Author(s):  
F. M. Houlihan ◽  
E. Chin ◽  
O. Nalamasu ◽  
J. M. Kometani

scholarly journals Chemical Amplification Mechanisms for Microlithography

1993 ◽  
pp. 2-24 ◽  
Author(s):  
E. Reichmanis ◽  
F. M. Houlihan ◽  
O. Nalamasu ◽  
T. X. Neenan
Keyword(s):  
Chemical Amplification

Top-Surface Imaging Using Selective Electroless Metallization of Patterned Monolayer Films

1993 ◽  
pp. 210-219 ◽  
Author(s):  
J. M. Calvert ◽  
W. J. Dressick ◽  
C. S. Dulcey ◽  
M. S. Chen ◽  
J. H. Georger ◽  
...  
Keyword(s):  
Surface Imaging ◽  
Monolayer Films ◽  
Electroless Metallization ◽  
Top Surface Imaging

An Alkaline-Developable Positive Resist Based on Silylated Polyhydroxystyrene for KrF Excimer Laser Lithography

1993 ◽  
pp. 88-100
Author(s):  
Eiichi Kobayashi ◽  
Makoto Murata ◽  
Mikio Yamachika ◽  
Yasutaka Kobayashi ◽  
Yoshiji Yumoto ◽  
...  
Keyword(s):  
Excimer Laser ◽  
Laser Lithography ◽  
Krf Excimer Laser ◽  
Positive Resist
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