Comparison of the lithographic characteristics of t-BOC-based chemically amplified resist system under deep-UV and electron-beam exposures

1994 ◽  
Author(s):  
Regine G. Tarascon-Auriol ◽  
Anthony E. Novembre ◽  
Woon W. Tai ◽  
Linus A. Fetter ◽  
Janet M. Kometani ◽  
...  
Keyword(s):  
Electron Beam ◽  
Chemically Amplified ◽  
Chemically Amplified Resist ◽  
Deep Uv

Sub-150-nm electron-beam lithography using AZPN114 chemically amplified resist

1997 ◽  
Author(s):  
Zheng Cui ◽  
R. A. Moody ◽  
Ian M. Loader ◽  
John G. Watson ◽  
Philip D. Prewett
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
Chemically Amplified ◽  
Chemically Amplified Resist

Single-component chemically amplified resist materials for electron-beam and x-ray lithography

1991 ◽  
Author(s):  
Anthony E. Novembre ◽  
Woon W. Tai ◽  
Janet M. Kometani ◽  
James E. Hanson ◽  
Omkaram Nalamasu ◽  
...  
Keyword(s):  
Electron Beam ◽  
Single Component ◽  
X Ray ◽  
Chemically Amplified ◽  
Chemically Amplified Resist

Optimization of chemically amplified resist for high-volume manufacturing by electron-beam direct writing toward 14nm node and beyond

2012 ◽  
Author(s):  
Jun-ichi Kon ◽  
Takashi Maruyama ◽  
Yoshinori Kojima ◽  
Yasushi Takahashi ◽  
Shinji Sugatani ◽  
...  
Keyword(s):  
Electron Beam ◽  
High Volume ◽  
Direct Writing ◽  
Chemically Amplified ◽  
Chemically Amplified Resist

Edge Roughness Study of Chemically Amplified Resist in Low-Energy Electron-Beam Lithography Using Computer Simulation

2002 ◽  
Vol 41 (Part 1, No. 6B) ◽  
pp. 4157-4162 ◽  
Author(s):  
Tetsuro Nakasugi ◽  
Atsushi Ando ◽  
Ryoichi Inanami ◽  
Noriaki Sasaki ◽  
Kazuyoshi Sugihara ◽  
...  
Keyword(s):  
Computer Simulation ◽  
Electron Beam ◽  
Electron Beam Lithography ◽  
Low Energy ◽  
Energy Electron ◽  
Chemically Amplified ◽  
Edge Roughness ◽  
Chemically Amplified Resist ◽  
Low Energy Electron

Electron-Beam Study of Nanometer Performances of the SAL 601 Chemically Amplified Resist

1998 ◽  
Vol 37 (Part 1, No. 8) ◽  
pp. 4632-4635 ◽  
Author(s):  
Massimo Gentili ◽  
Annamaria Gerardino ◽  
Enzo Di Fabrizio
Keyword(s):  
Electron Beam ◽  
Chemically Amplified ◽  
Chemically Amplified Resist
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