Accurate secondary ion mass spectrometry analysis of shallow doping profiles in Si based on the internal standard method

Author(s):  
G. L. Liu
2015 ◽  
Vol 87 (15) ◽  
pp. 7795-7802 ◽  
Author(s):  
Rainer Kassenböhmer ◽  
Felix Draude ◽  
Martin Körsgen ◽  
Andreas Pelster ◽  
Heinrich F. Arlinghaus

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