A study of the effect of ultrasonic agitation during development of poly(methylmethacrylate) for ultrahigh resolution electron-beam lithography

J. M. Ryan

doi:10.1116/1.588317

A study of the effect of ultrasonic agitation during development of poly(methylmethacrylate) for ultrahigh resolution electron-beam lithography

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.588317 ◽

1995 ◽

Vol 13 (6) ◽

pp. 3035 ◽

Cited By ~ 18

Author(s):

J. M. Ryan

Keyword(s):

Electron Beam ◽

Electron Beam Lithography ◽

Ultrahigh Resolution ◽

Ultrasonic Agitation ◽

Resolution Electron

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Influence of hydrogen silsesquioxane resist exposure temperature on ultrahigh resolution electron beam lithography

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ◽

10.1116/1.2987965 ◽

2008 ◽

Vol 26 (6) ◽

pp. 2049-2053 ◽

Cited By ~ 12

Author(s):

Vadim Sidorkin ◽

Emile van der Drift ◽

Huub Salemink

Keyword(s):

Electron Beam ◽

Electron Beam Lithography ◽

Hydrogen Silsesquioxane ◽

Ultrahigh Resolution ◽

Exposure Temperature ◽

Resolution Electron

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Self-assembled monolayers of poly(ethylene glycol) siloxane as a resist for ultrahigh-resolution electron beam lithography on silicon oxide

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ◽

10.1116/1.3212899 ◽

2009 ◽

Vol 27 (5) ◽

pp. 2292 ◽

Cited By ~ 6

Author(s):

Bo Gao ◽

Gary H. Bernstein ◽

Marya Lieberman

Keyword(s):

Electron Beam ◽

Ethylene Glycol ◽

Electron Beam Lithography ◽

Silicon Oxide ◽

Self Assembled Monolayers ◽

Poly Ethylene Glycol ◽

Ultrahigh Resolution ◽

Resolution Electron ◽

Assembled Monolayers ◽

Poly Ethylene

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Sub‐50 nm high aspect‐ratio silicon pillars, ridges, and trenches fabricated using ultrahigh resolution electron beam lithography and reactive ion etching

Applied Physics Letters ◽

10.1063/1.108696 ◽

1993 ◽

Vol 62 (12) ◽

pp. 1414-1416 ◽

Cited By ~ 35

Author(s):

P. B. Fischer ◽

S. Y. Chou

Keyword(s):

Electron Beam ◽

Aspect Ratio ◽

High Aspect Ratio ◽

Electron Beam Lithography ◽

Reactive Ion Etching ◽

Ultrahigh Resolution ◽

Ion Etching ◽

Resolution Electron ◽

Silicon Pillars

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Ultrahigh resolution of calixarene negative resist in electron beam lithography

Applied Physics Letters ◽

10.1063/1.115958 ◽

1996 ◽

Vol 68 (9) ◽

pp. 1297-1299 ◽

Cited By ~ 191

Author(s):

J. Fujita ◽

Y. Ohnishi ◽

Y. Ochiai ◽

S. Matsui

Keyword(s):

Electron Beam ◽

Electron Beam Lithography ◽

Ultrahigh Resolution

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Influence of the development process on ultimate resolution electron beam lithography, using ultrathin hydrogen silsesquioxane resist layers

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ◽

10.1116/1.2794316 ◽

2007 ◽

Vol 25 (6) ◽

pp. 1998 ◽

Cited By ~ 21

Author(s):

Anda E. Grigorescu ◽

Marco C. van der Krogt ◽

Cees W. Hagen ◽

Pieter Kruit

Keyword(s):

Electron Beam ◽

Electron Beam Lithography ◽

Development Process ◽

Hydrogen Silsesquioxane ◽

Resolution Electron

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Ultrahigh-resolution pattern using electron-beam lithography HF wet etching

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ◽

10.1116/1.2743653 ◽

2007 ◽

Vol 25 (4) ◽

pp. 1147 ◽

Cited By ~ 9

Author(s):

R. Tiron ◽

L. Mollard ◽

O. Louveau ◽

E. Lajoinie

Keyword(s):

Electron Beam ◽

Electron Beam Lithography ◽

Wet Etching ◽

Ultrahigh Resolution

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High resolution electron beam lithography on CaF2

Applied Physics Letters ◽

10.1063/1.94769 ◽

1984 ◽

Vol 44 (4) ◽

pp. 468-469 ◽

Cited By ~ 38

Author(s):

P. M. Mankiewich ◽

H. G. Craighead ◽

T. R. Harrison ◽

A. H. Dayem

Keyword(s):

Electron Beam ◽

High Resolution ◽

Electron Beam Lithography ◽

Resolution Electron

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Realization of ultra-thin HSQ resist layer for high resolution electron beam lithography using liquid splitting process

Microelectronic Engineering ◽

10.1016/j.mee.2014.05.011 ◽

2014 ◽

Vol 123 ◽

pp. 62-64

Author(s):

Jung Wuk Kim ◽

Jens Bolten ◽

Christian Moormann ◽

Heinrich Kurz

Keyword(s):

Electron Beam ◽

High Resolution ◽

Electron Beam Lithography ◽

Resolution Electron ◽

Splitting Process

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High-throughput, high-resolution electron beam lithography

Microelectronics Reliability ◽

10.1016/0026-2714(89)90139-x ◽

1989 ◽

Vol 29 (6) ◽

pp. 1104

Keyword(s):

Electron Beam ◽

High Resolution ◽

High Throughput ◽

Electron Beam Lithography ◽

Resolution Electron

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High-performance negative electron affinity photocathodes for high resolution electron beam lithography and metrology

Proceedings of International Electron Devices Meeting ◽

10.1109/iedm.1995.499226 ◽

2002 ◽

Cited By ~ 2

Author(s):

A.W. Baum ◽

J.E. Schneider ◽

R.F.W. Pease

Keyword(s):

Electron Beam ◽

High Resolution ◽

Electron Affinity ◽

Electron Beam Lithography ◽

High Performance ◽

Negative Electron Affinity ◽

Resolution Electron

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