Self-assembled monolayers of poly(ethylene glycol) siloxane as a resist for ultrahigh-resolution electron beam lithography on silicon oxide
2009 ◽
Vol 27
(5)
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pp. 2292
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1999 ◽
Vol 121
(44)
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pp. 10379-10388
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2004 ◽
Vol 121
(11)
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pp. 5427-5433
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2011 ◽
Vol 34
(9)
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pp. 898-907
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2006 ◽
Vol 301
(1)
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pp. 337-341
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