Influence of hydrogen silsesquioxane resist exposure temperature on ultrahigh resolution electron beam lithography
2008 ◽
Vol 26
(6)
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pp. 2049-2053
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1995 ◽
Vol 13
(6)
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pp. 3035
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2013 ◽
Vol 31
(6)
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pp. 06F102
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Keyword(s):
2009 ◽
Vol 27
(5)
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pp. 2292
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2007 ◽
Vol 25
(4)
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pp. 1147
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Keyword(s):