Fluoride etch masks for high-resolution pattern transfer

1990 ◽  
Vol 8 (1) ◽  
pp. 28 ◽  
Author(s):  
A. Scherer
Keyword(s):  
High Resolution ◽  
Pattern Transfer ◽  
Etch Masks

High resolution pattern transfer in III-nitrides using BCl3/Ar inductively coupled plasmas

1998 ◽  
Vol 42 (9) ◽  
pp. 1719-1722
Author(s):  
Hyun Cho ◽  
S.M Donovan ◽  
J.D MacKenzie ◽  
C.R Abernathy ◽  
S.J Pearton ◽  
...  
Keyword(s):  
High Resolution ◽  
Pattern Transfer ◽  
Inductively Coupled Plasmas ◽  
Inductively Coupled ◽  
Coupled Plasmas

Pattern transfer with stabilized nanoparticle etch masks

2013 ◽  
Vol 24 (8) ◽  
pp. 085303 ◽  
Author(s):  
Charles R Hogg ◽  
Yoosuf N Picard ◽  
Amrit Narasimhan ◽  
James A Bain ◽  
Sara A Majetich
Keyword(s):  
Pattern Transfer ◽  
Etch Masks

A photoacid generator integrated terpolymer for electron beam lithography applications: sensitive resist with pattern transfer potential

2017 ◽  
Vol 1 (9) ◽  
pp. 1895-1899 ◽  
Author(s):  
Santu Nandi ◽  
Midathala Yogesh ◽  
Pulikanti Guruprasad Reddy ◽  
Satinder K. Sharma ◽  
Chullikkattil P. Pradeep ◽  
...  
Keyword(s):  
Electron Beam ◽  
High Resolution ◽  
Electron Beam Lithography ◽  
Pattern Transfer ◽  
Photoacid Generator ◽  
Transfer Potential

A new PAG integrated electron beam active terpolymer resist has been developed for high resolution pattern transfer applications.

Conversion of a Patterned Organic Resist into a High Performance Inorganic Hard Mask for High Resolution Pattern Transfer

ACS Nano ◽  
2018 ◽  
Vol 12 (11) ◽  
pp. 11152-11160 ◽  
Author(s):  
Jean-François de Marneffe ◽  
Boon Teik Chan ◽  
Martin Spieser ◽  
Guy Vereecke ◽  
Sergej Naumov ◽  
...  
Keyword(s):  
High Resolution ◽  
High Performance ◽  
Pattern Transfer ◽  
Hard Mask

Evaluation of an advanced dual hard mask stack for high resolution pattern transfer

2013 ◽  
Author(s):  
J. Paul ◽  
M. Rudolph ◽  
S. Riedel ◽  
X. Thrun ◽  
S. Wege ◽  
...  
Keyword(s):  
High Resolution ◽  
Pattern Transfer ◽  
Hard Mask
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