Compositional characterization of very thin SiO2/Si3N4/SiO2 stacked films by x-ray photoemission spectroscopy and time-of-flight-secondary-ion-mass spectroscopy techniques

1997 ◽  
Vol 15 (3) ◽  
pp. 905-910 ◽  
Author(s):  
S. Santucci ◽  
L. Lozzi ◽  
L. Ottaviano ◽  
M. Passacantando ◽  
P. Picozzi ◽  
...  
2005 ◽  
Vol 37 (5) ◽  
pp. 459-465 ◽  
Author(s):  
S. Diplas ◽  
J. Lehrmann ◽  
S. Jørgensen ◽  
T. Våland ◽  
J. F. Watts ◽  
...  

Langmuir ◽  
2005 ◽  
Vol 21 (1) ◽  
pp. 280-286 ◽  
Author(s):  
Catherine Combellas ◽  
Frédéric Kanoufi ◽  
Jean Pinson ◽  
Fetah I. Podvorica

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