Low-temperature deposition of high-quality silicon dioxide films by sputtering-type electron cyclotron resonance plasma

1997 ◽  
Vol 15 (4) ◽  
pp. 1951-1954 ◽  
Author(s):  
H. Nakashima ◽  
K. Furukawa ◽  
Y. C. Liu ◽  
D. W. Gao ◽  
Y. Kashiwazaki ◽  
...  
Keyword(s):  
Low Temperature ◽  
Silicon Dioxide ◽  
Cyclotron Resonance ◽  
Electron Cyclotron Resonance ◽  
Electron Cyclotron ◽  
High Quality ◽  
Electron Cyclotron Resonance Plasma ◽  
Low Temperature Deposition ◽  
Temperature Deposition ◽  
Resonance Plasma

Deposition of High-Quality Silicon Oxynitride Film at Low Temperature by Using a Sputtering-Type Electron Cyclotron Resonance Plasma

1997 ◽  
Vol 36 (Part 2, No. 12B) ◽  
pp. L1692-L1694 ◽  
Author(s):  
Da-Wei Gao ◽  
Yasuhiro Kashiwazaki ◽  
Katsunori Muraoka ◽  
Hiroshi Nakashima ◽  
Katsuhiko Furukawa ◽  
...  
Keyword(s):  
Low Temperature ◽  
Cyclotron Resonance ◽  
Electron Cyclotron Resonance ◽  
Electron Cyclotron ◽  
Silicon Oxynitride ◽  
High Quality ◽  
Electron Cyclotron Resonance Plasma ◽  
Oxynitride Film ◽  
Resonance Plasma
Sign in / Sign up

Export Citation Format

Share Document