Low Temperature Deposition of SiO2 by Distributed Electron Cyclotron Resonance Plasma‐Enhanced Chemical Vapor Deposition

1992 ◽  
Vol 139 (5) ◽  
pp. 1489-1495 ◽  
Author(s):  
F. Plais ◽  
B. Agius ◽  
F. Abel ◽  
J. Siejka ◽  
M. Puech ◽  
...  
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