Simulations of real‐time control of two‐dimensional features in inductively coupled plasma sources for etching applications
1995 ◽
Vol 13
(5)
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pp. 2456-2463
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Keyword(s):
2003 ◽
Vol 21
(4)
◽
pp. 1183-1187
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Keyword(s):
Keyword(s):
1994 ◽
Vol 12
(1)
◽
pp. 478
◽
Keyword(s):
Keyword(s):
Keyword(s):