Real-time control of ion density and ion energy in chlorine inductively coupled plasma etch processing
2003 ◽
Vol 21
(4)
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pp. 1183-1187
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Keyword(s):
1995 ◽
Vol 13
(5)
◽
pp. 2456-2463
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Keyword(s):
Keyword(s):
2005 ◽
Vol 44
(10)
◽
pp. 7234-7237
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Keyword(s):
Keyword(s):
2007 ◽
Vol 73
(12)
◽
pp. 1369-1374