Two‐dimensional hybrid model of inductively coupled plasma sources for etching
Keyword(s):
1994 ◽
Vol 12
(1)
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pp. 478
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Keyword(s):
1995 ◽
Vol 13
(5)
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pp. 2456-2463
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Keyword(s):
Keyword(s):
1995 ◽
Vol 23
(1)
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pp. 65-73
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2011 ◽
Vol 39
(11)
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pp. 2536-2537
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Keyword(s):
2007 ◽
Vol 1139
(2)
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pp. 247-253
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