Remote plasma-enhanced atomic layer deposition of metallic TiN films with low work function and high uniformity

2018 ◽  
Vol 36 (4) ◽  
pp. 041501 ◽  
Author(s):  
Yafeng Zhu ◽  
Fangsen Li ◽  
Rong Huang ◽  
Tong Liu ◽  
Yanfei Zhao ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Work Function ◽  
Atomic Layer ◽  
Remote Plasma ◽  
Tin Films ◽  
Layer Deposition ◽  
High Uniformity

The annealing effect on work function variation of WN x C y films deposited by remote plasma atomic layer deposition

2017 ◽  
Vol 214 (7) ◽  
pp. 1700010
Author(s):  
Hyunjung Kim ◽  
Woochool Jang ◽  
Changhee Shin ◽  
Kunyoung Lee ◽  
Heewoo Lim ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Work Function ◽  
Atomic Layer ◽  
Annealing Effect ◽  
Remote Plasma ◽  
Layer Deposition

Conformality of remote plasma-enhanced atomic layer deposition processes: An experimental study

2012 ◽  
Vol 30 (1) ◽  
pp. 01A115 ◽  
Author(s):  
Maarit Kariniemi ◽  
Jaakko Niinistö ◽  
Marko Vehkamäki ◽  
Marianna Kemell ◽  
Mikko Ritala ◽  
...  
Keyword(s):  
Experimental Study ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Remote Plasma ◽  
Layer Deposition ◽  
Deposition Processes

scholarly journals Remote plasma enhanced atomic layer deposition of ZnO for thin film electronic applications

2012 ◽  
Vol 97 ◽  
pp. 162-165 ◽  
Author(s):  
S.M. Sultan ◽  
O.D. Clark ◽  
T.B. Masaud ◽  
Q. Fang ◽  
R. Gunn ◽  
...  
Keyword(s):  
Thin Film ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Remote Plasma ◽  
Layer Deposition
Sign in / Sign up

Export Citation Format

Share Document