scholarly journals Low-temperature remote plasma enhanced atomic layer deposition of ZrO2/zircone nanolaminate film for efficient encapsulation of flexible organic light-emitting diodes

2017 ◽  
Vol 7 (1) ◽  
Author(s):  
Zheng Chen ◽  
Haoran Wang ◽  
Xiao Wang ◽  
Ping Chen ◽  
Yunfei Liu ◽  
...  
Keyword(s):  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Light Emitting Diodes ◽  
Atomic Layer ◽  
Organic Light Emitting Diodes ◽  
Remote Plasma ◽  
Light Emitting ◽  
Organic Light ◽  
Layer Deposition

Low-temperature gas-barrier films by atomic layer deposition for encapsulating organic light-emitting diodes

2016 ◽  
Vol 27 (29) ◽  
pp. 295706 ◽  
Author(s):  
Ming-Hung Tseng ◽  
Hui-Huan Yu ◽  
Kun-Yi Chou ◽  
Jwo-Huei Jou ◽  
Kung-Liang Lin ◽  
...  
Keyword(s):  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Light Emitting Diodes ◽  
Atomic Layer ◽  
Organic Light Emitting Diodes ◽  
Gas Barrier ◽  
Light Emitting ◽  
Barrier Films ◽  
Organic Light ◽  
Layer Deposition

Realization of highly-dense Al2O3 gas barrier for top-emitting organic light-emitting diodes by atomic layer deposition

RSC Advances ◽  
2015 ◽  
Vol 5 (127) ◽  
pp. 104613-104620 ◽  
Author(s):  
Min Li ◽  
Dongyu Gao ◽  
Shuo Li ◽  
Zhongwei Zhou ◽  
Jianhua Zou ◽  
...  
Keyword(s):  
Thin Film ◽  
Atomic Layer Deposition ◽  
Light Emitting Diodes ◽  
Atomic Layer ◽  
Organic Light Emitting Diodes ◽  
Gas Barrier ◽  
Light Emitting ◽  
Organic Light ◽  
Layer Deposition ◽  
Thin Film Encapsulation

In this paper Al2O3 films are prepared with a method of atomic layer deposition (ALD) as the thin film encapsulation technology for top-emitting organic light-emitting diodes (TE-OLED).

Sign in / Sign up

Export Citation Format

Share Document