The annealing effect on work function variation of WN
x
C
y
films deposited by remote plasma atomic layer deposition
Keyword(s):
2018 ◽
Vol 36
(4)
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pp. 041501
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Keyword(s):
2003 ◽
Vol 42
(Part 2, No. 4B)
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pp. L414-L416
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Keyword(s):
Keyword(s):
2019 ◽
Vol 28
(8)
◽
pp. 084005
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Keyword(s):
2012 ◽
Vol 30
(1)
◽
pp. 01A115
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Keyword(s):
2012 ◽
Vol 97
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pp. 162-165
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