Remote plasma enhanced atomic layer deposition of titanium nitride film using metal organic precursor (C12H23N3Ti) and N2 plasma

2020 ◽  
pp. 148482
Author(s):  
Byunguk Kim ◽  
Namgue Lee ◽  
Junghoon Lee ◽  
Taehun Park ◽  
Hyunwoo Park ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Titanium Nitride ◽  
Atomic Layer ◽  
Nitride Film ◽  
Remote Plasma ◽  
Organic Precursor ◽  
Layer Deposition ◽  
Metal Organic ◽  
Titanium Nitride Film ◽  
N2 Plasma

Investigations of titanium nitride as metal gate material, elaborated by metal organic atomic layer deposition using TDMAT and NH3

2005 ◽  
Vol 82 (3-4) ◽  
pp. 248-253 ◽  
Author(s):  
F. Fillot ◽  
T. Morel ◽  
S. Minoret ◽  
I. Matko ◽  
S. Maîtrejean ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Titanium Nitride ◽  
Atomic Layer ◽  
Metal Gate ◽  
Layer Deposition ◽  
Metal Organic

scholarly journals Tertiary alkyl halides as growth activator and inhibitor for novel atomic layer deposition of low resistive titanium nitride

AIP Advances ◽  
2021 ◽  
Vol 11 (1) ◽  
pp. 015218
Author(s):  
Changbong Yeon ◽  
Jaesun Jung ◽  
Hyeran Byun ◽  
Kok Chew Tan ◽  
Taeho Song ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Titanium Nitride ◽  
Atomic Layer ◽  
Alkyl Halides ◽  
Layer Deposition ◽  
Tertiary Alkyl
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