Low-temperature atomic layer deposition of copper(II) oxide thin films

2016 ◽  
Vol 34 (1) ◽  
pp. 01A109 ◽  
Author(s):  
Tomi Iivonen ◽  
Jani Hämäläinen ◽  
Benoît Marchand ◽  
Kenichiro Mizohata ◽  
Miika Mattinen ◽  
...  
Keyword(s):  
Thin Films ◽  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Oxide Thin Films ◽  
Layer Deposition

scholarly journals Low-temperature atomic layer deposition of crystalline manganese oxide thin films

2016 ◽  
Vol 45 (46) ◽  
pp. 18737-18741 ◽  
Author(s):  
Hua Jin ◽  
Dirk Hagen ◽  
Maarit Karppinen
Keyword(s):  
Thin Films ◽  
Phase Composition ◽  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Manganese Oxide ◽  
Deposition Temperature ◽  
Atomic Layer ◽  
Oxide Thin Films ◽  
Layer Deposition

We present a new low-temperature atomic layer deposition (ALD) process based on Mn2(CO)10and ozone as precursors to fabricate crystalline α-Mn2O3and Mn3O4thin films; the phase composition is controlled by the deposition temperature such that the former phase forms in the range 60–100 °C and the latter in the range 120–160 °C.

scholarly journals Low-temperature atomic layer deposition of indium oxide thin films using trimethylindium and oxygen plasma

2021 ◽  
Vol 39 (6) ◽  
pp. 062406
Author(s):  
Ali Mahmoodinezhad ◽  
Carlos Morales ◽  
Franziska Naumann ◽  
Paul Plate ◽  
Robert Meyer ◽  
...  
Keyword(s):  
Thin Films ◽  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Indium Oxide ◽  
Oxygen Plasma ◽  
Atomic Layer ◽  
Oxide Thin Films ◽  
Layer Deposition

Low Temperature Formation of Silicon Oxide Thin Films by Atomic Layer Deposition Using NH3/O2 Plasma

2013 ◽  
Vol 2 (12) ◽  
pp. P114-P116 ◽  
Author(s):  
J.-S. Choi ◽  
B. S. Yang ◽  
S.-J. Won ◽  
J. R. Kim ◽  
S. Suh ◽  
...  
Keyword(s):  
Thin Films ◽  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Silicon Oxide ◽  
Atomic Layer ◽  
Oxide Thin Films ◽  
Layer Deposition ◽  
O2 Plasma

Low temperature growth of gallium oxide thin films via plasma enhanced atomic layer deposition

2017 ◽  
Vol 46 (47) ◽  
pp. 16551-16561 ◽  
Author(s):  
Richard O'Donoghue ◽  
Julian Rechmann ◽  
Morteza Aghaee ◽  
Detlef Rogalla ◽  
Hans-Werner Becker ◽  
...  
Keyword(s):  
Thin Films ◽  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Gallium Oxide ◽  
Atomic Layer ◽  
Oxide Thin Films ◽  
Temperature Growth ◽  
Low Temperature Growth ◽  
Layer Deposition

Lowest temperature to date for the ALD growth of Ga2O3 thin films and the 2nd highest GPC regarding Ga2O3 ALD.

Low Temperature Growth of Beryllium Oxide Thin Films Prepared via Plasma Enhanced Atomic Layer Deposition

2021 ◽  
pp. 151405
Author(s):  
Yoonseo Jang ◽  
Dohwan Jung ◽  
Prakash R. Sultane ◽  
Eric S. Larsen ◽  
Christopher W. Bielawski ◽  
...  
Keyword(s):  
Thin Films ◽  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Beryllium Oxide ◽  
Atomic Layer ◽  
Oxide Thin Films ◽  
Temperature Growth ◽  
Low Temperature Growth ◽  
Layer Deposition

scholarly journals Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films

2019 ◽  
Vol 25 (4) ◽  
pp. 233-242 ◽  
Author(s):  
Stephen E. Potts ◽  
Luc R. Van den Elzen ◽  
Gijs Dingemans ◽  
Erik Langereis ◽  
Wytze Keuning ◽  
...  
Keyword(s):  
Thin Films ◽  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Metal Oxide ◽  
Atomic Layer ◽  
Low Temperature Plasma ◽  
Oxide Thin Films ◽  
Temperature Plasma ◽  
Metal Oxide Thin Films ◽  
Layer Deposition
Sign in / Sign up

Export Citation Format

Share Document