Low temperature growth of gallium oxide thin films via plasma enhanced atomic layer deposition
Keyword(s):
Lowest temperature to date for the ALD growth of Ga2O3 thin films and the 2nd highest GPC regarding Ga2O3 ALD.
2020 ◽
Vol 38
(2)
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pp. 022404
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2008 ◽
Vol 53
(9(5))
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pp. 2880-2883
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2016 ◽
Vol 34
(4)
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pp. 041511
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2007 ◽
Vol 50
(6)
◽
pp. 1716
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2018 ◽
Vol 459
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pp. 830-834
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