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2014 ◽  
Vol 32 (6) ◽  
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Sudharshanan Raghunathan ◽  
Obert R. Wood ◽  
Pawitter Mangat ◽  
Erik Verduijn ◽  
Vicky Philipsen ◽  
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Numerical Aperture ◽  
Experimental Measurements ◽  
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Tolerance Analysis of High-Numerical Aperture Extreme Ultraviolet Lithographic Objective

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Vol 52 (12) ◽  
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孙圆圆 Sun Yuanyuan ◽  
李艳秋 Li Yanqiu ◽  
曹振 Cao Zhen
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Extreme Ultraviolet ◽  
Numerical Aperture ◽  
Tolerance Analysis ◽  
High Numerical Aperture

Development of projection optics set-3 for high-numerical-aperture extreme ultraviolet exposure tool (HiNA)

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Vol 22 (6) ◽  
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Tetsuya Oshino ◽  
Shinichi Takahashi ◽  
Takahiro Yamamoto ◽  
Tatsuya Miyoshi ◽  
Masayuki Shiraishi ◽  
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Keyword(s):  
Extreme Ultraviolet ◽  
Numerical Aperture ◽  
High Numerical Aperture ◽  
Ultraviolet Exposure ◽  
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Driving the industry towards a consensus on high numerical aperture (high-NA) extreme ultraviolet (EUV)

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Author(s):  
Patrick A. Kearney ◽  
Obert Wood ◽  
Eric Hendrickx ◽  
Greg McIntyre ◽  
Soichi Inoue ◽  
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Extreme Ultraviolet ◽  
Numerical Aperture ◽  
High Numerical Aperture

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毛姗姗 Mao Shanshan ◽  
李艳秋 Li Yanqiu ◽  
刘 克 Liu Ke ◽  
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郑 猛 Zheng Meng ◽  
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Keyword(s):  
Extreme Ultraviolet ◽  
Optical Design ◽  
Numerical Aperture ◽  
Extreme Ultraviolet Lithography ◽  
Freeform Surfaces ◽  
Ultraviolet Lithography ◽  
High Numerical Aperture
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