Lithographic characterization of the flare in the Berkeley 0.3 numerical aperture extreme ultraviolet microfield optic

2006 ◽  
Vol 24 (3) ◽  
pp. 1234 ◽  
Author(s):  
Jason P. Cain ◽  
Patrick P. Naulleau ◽  
Eric M. Gullikson ◽  
Costas J. Spanos
Keyword(s):  
Extreme Ultraviolet ◽  
Numerical Aperture

scholarly journals Wavefront Sensing for Evaluation of Extreme Ultraviolet Microscopy

Sensors ◽  
2020 ◽  
Vol 20 (22) ◽  
pp. 6426
Author(s):  
Mabel Ruiz-Lopez ◽  
Masoud Mehrjoo ◽  
Barbara Keitel ◽  
Elke Plönjes ◽  
Domenico Alj ◽  
...  
Keyword(s):  
Extreme Ultraviolet ◽  
Numerical Aperture ◽  
Laser Flash ◽  
Optical Systems ◽  
Wavefront Sensor ◽  
Reliable Technique ◽  
Phase Measurements ◽  
X Ray ◽  
Classical Calculation

Wavefront analysis is a fast and reliable technique for the alignment and characterization of optics in the visible, but also in the extreme ultraviolet (EUV) and X-ray regions. However, the technique poses a number of challenges when used for optical systems with numerical apertures (NA) > 0.1. A high-numerical-aperture Hartmann wavefront sensor was employed at the free electron laser FLASH for the characterization of a Schwarzschild objective. These are widely used in EUV to achieve very small foci, particularly for photolithography. For this purpose, Schwarzschild objectives require highly precise alignment. The phase measurements acquired with the wavefront sensor were analyzed employing two different methods, namely, the classical calculation of centroid positions and Fourier demodulation. Results from both approaches agree in terms of wavefront maps with negligible degree of discrepancy.

At-wavelength, system-level flare characterization of extreme-ultraviolet optical systems

2000 ◽  
Vol 39 (17) ◽  
pp. 2941 ◽  
Author(s):  
Patrick Naulleau ◽  
Kenneth A. Goldberg ◽  
Eric M. Gullikson ◽  
Jeffrey Bokor
Keyword(s):  
Extreme Ultraviolet ◽  
System Level ◽  
Optical Systems

scholarly journals Direct spectrotemporal characterization of femtosecond extreme-ultraviolet pulses

2013 ◽  
Vol 88 (3) ◽  
Author(s):  
David Gauthier ◽  
Benoît Mahieu ◽  
Giovanni De Ninno
Keyword(s):  
Extreme Ultraviolet

Extreme ultraviolet microexposures at the Advanced Light Source using the 0.3 numerical aperture micro-exposure tool optic

2004 ◽  
Vol 22 (6) ◽  
pp. 2962 ◽  
Author(s):  
Patrick P. Naulleau ◽  
Kenneth A. Goldberg ◽  
Erik Anderson ◽  
Jason P. Cain ◽  
Paul Denham ◽  
...  
Keyword(s):  
Light Source ◽  
Extreme Ultraviolet ◽  
Numerical Aperture ◽  
Advanced Light Source

Characterization of extreme ultraviolet emission using the fourth harmonic of a Nd:YAG laser

2005 ◽  
Vol 86 (18) ◽  
pp. 181107 ◽  
Author(s):  
Michiteru Yamaura ◽  
Shigeaki Uchida ◽  
Atsushi Sunahara ◽  
Yoshinori Shimada ◽  
Hiroaki Nishimura ◽  
...  
Keyword(s):  
Nd:Yag Laser ◽  
Extreme Ultraviolet ◽  
Ultraviolet Emission ◽  
Fourth Harmonic

scholarly journals Deposition and characterization of B4C/CeO2 multilayers at 6.x nm extreme ultraviolet wavelengths

2016 ◽  
Vol 119 (9) ◽  
pp. 095301 ◽  
Author(s):  
M. G. Sertsu ◽  
A. Giglia ◽  
S. Brose ◽  
D. Park ◽  
Z. S. Wang ◽  
...  
Keyword(s):  
Extreme Ultraviolet
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