Characterization of out-of-band radiation and plasma parameters in laser-produced Sn plasmas for extreme ultraviolet lithography light sources

S. Namba; S. Fujioka; H. Sakaguchi; H. Nishimura; Y. Yasuda; K. Nagai; N. Miyanaga; Y. Izawa; K. Mima; K. Sato; K. Takiyama

doi:10.1063/1.2952033

Characterization of out-of-band radiation and plasma parameters in laser-produced Sn plasmas for extreme ultraviolet lithography light sources

Journal of Applied Physics ◽

10.1063/1.2952033 ◽

2008 ◽

Vol 104 (1) ◽

pp. 013305 ◽

Cited By ~ 15

Author(s):

S. Namba ◽

S. Fujioka ◽

H. Sakaguchi ◽

H. Nishimura ◽

Y. Yasuda ◽

...

Keyword(s):

Extreme Ultraviolet ◽

Light Sources ◽

Extreme Ultraviolet Lithography ◽

Plasma Parameters ◽

Ultraviolet Lithography

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Time-resolved spatial profiles of electron density and temperature in hydrogen plasmas induced by radiation from laser-produced tin plasmas for extreme ultraviolet lithography light sources

Japanese Journal of Applied Physics ◽

10.35848/1347-4065/abfadc ◽

2021 ◽

Author(s):

Kouichiro Kouge ◽

Kentaro Tomita ◽

Junya Hotta ◽

Yiming Pan ◽

Hiroaki Tomuro ◽

...

Keyword(s):

Electron Density ◽

Extreme Ultraviolet ◽

Light Sources ◽

Extreme Ultraviolet Lithography ◽

Time Resolved ◽

Ultraviolet Lithography ◽

Hydrogen Plasmas ◽

Electron Density And Temperature ◽

Tin Plasmas

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Characterization of extreme ultraviolet lithography mask defects from extreme ultraviolet far-field scattering patterns

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.1319843 ◽

2000 ◽

Vol 18 (6) ◽

pp. 2930 ◽

Cited By ~ 2

Author(s):

Moonsuk Yi ◽

Seongtae Jeong ◽

Seno Rekawa ◽

Jeffrey Bokor

Keyword(s):

Extreme Ultraviolet ◽

Far Field ◽

Extreme Ultraviolet Lithography ◽

Ultraviolet Lithography

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Picosecond ultrasonic characterization of Mo/Si multilayers for extreme ultraviolet lithography

10.1117/12.351136 ◽

1999 ◽

Cited By ~ 2

Author(s):

Nen-Wen Pu ◽

Seongtae Jeong ◽

Rian Zhao ◽

Jeffrey Bokor

Keyword(s):

Extreme Ultraviolet ◽

Extreme Ultraviolet Lithography ◽

Ultraviolet Lithography ◽

Ultrasonic Characterization

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Characterization of multilayer reflective coatings for extreme ultraviolet lithography

10.1063/1.1291768 ◽

2000 ◽

Author(s):

Marco Wedowski

Keyword(s):

Extreme Ultraviolet ◽

Extreme Ultraviolet Lithography ◽

Ultraviolet Lithography ◽

Reflective Coatings

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Time-resolved two-dimensional profiles of electron density and temperature of laser-produced tin plasmas for extreme-ultraviolet lithography light sources

Scientific Reports ◽

10.1038/s41598-017-11685-0 ◽

2017 ◽

Vol 7 (1) ◽

Cited By ~ 10

Author(s):

Kentaro Tomita ◽

Yuta Sato ◽

Syouichi Tsukiyama ◽

Toshiaki Eguchi ◽

Kiichiro Uchino ◽

...

Keyword(s):

Electron Density ◽

Extreme Ultraviolet ◽

Light Sources ◽

Two Dimensional ◽

Extreme Ultraviolet Lithography ◽

Time Resolved ◽

Ultraviolet Lithography ◽

Electron Density And Temperature ◽

Tin Plasmas

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Laser-produced plasma versus laser-assisted discharge plasma: physics and technology of extreme ultraviolet lithography light sources

Journal of Micro/Nanolithography MEMS and MOEMS ◽

10.1117/1.jmm.11.2.021104 ◽

2012 ◽

Vol 11 (2) ◽

pp. 021104-1 ◽

Cited By ~ 7

Author(s):

Guido Schriever ◽

Olivier Semprez ◽

Jeroen Jonkers ◽

Masaki Yoshioka ◽

Rolf Apetz

Keyword(s):

Plasma Physics ◽

Discharge Plasma ◽

Extreme Ultraviolet ◽

Light Sources ◽

Extreme Ultraviolet Lithography ◽

Ultraviolet Lithography ◽

Laser Produced Plasma

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Velocity characterization of particulate debris from laser-produced plasmas used for extreme-ultraviolet lithography

Applied Optics ◽

10.1364/ao.34.006513 ◽

1995 ◽

Vol 34 (28) ◽

pp. 6513 ◽

Cited By ~ 13

Author(s):

H. A. Bender ◽

D. O’Connell ◽

W. T. Silfvast

Keyword(s):

Extreme Ultraviolet ◽

Extreme Ultraviolet Lithography ◽

Ultraviolet Lithography ◽

Particulate Debris

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Experimental test chamber design for optics exposure testing and debris characterization of a xenon discharge produced plasma source for extreme ultraviolet lithography

Microelectronic Engineering ◽

10.1016/j.mee.2005.11.012 ◽

2006 ◽

Vol 83 (3) ◽

pp. 476-484 ◽

Cited By ~ 15

Author(s):

Keith C. Thompson ◽

Erik L. Antonsen ◽

Matthew R. Hendricks ◽

Brian E. Jurczyk ◽

M. Williams ◽

...

Keyword(s):

Experimental Test ◽

Extreme Ultraviolet ◽

Test Chamber ◽

Plasma Source ◽

Extreme Ultraviolet Lithography ◽

Ultraviolet Lithography ◽

Chamber Design ◽

Exposure Testing

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Characterization of Surface Variation of Chemically Amplified Photoresist to Evaluate Extreme Ultraviolet Lithography Stochastics Effects

Journal of Photopolymer Science and Technology ◽

10.2494/photopolymer.34.63 ◽

2021 ◽

Vol 34 (1) ◽

pp. 63-70

Author(s):

Eric Liu ◽

Amir Hegazy ◽

Hyeonseon Choi ◽

Maximilian Weires ◽

Robert Brainard ◽

...

Keyword(s):

Extreme Ultraviolet ◽

Extreme Ultraviolet Lithography ◽

Ultraviolet Lithography ◽

Chemically Amplified ◽

Surface Variation ◽

Chemically Amplified Photoresist

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Characterization of an expanded-field Schwarzschild objective for extreme ultraviolet lithography

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.587448 ◽

1994 ◽

Vol 12 (6) ◽

pp. 3820 ◽

Cited By ~ 3

Author(s):

G. D. Kubiak

Keyword(s):

Extreme Ultraviolet ◽

Extreme Ultraviolet Lithography ◽

Ultraviolet Lithography

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