Characterization of the synchrotron-based 0.3 numerical aperture extreme ultraviolet microexposure tool at the Advanced Light Source

2005 ◽  
Vol 23 (6) ◽  
pp. 2840 ◽  
Author(s):  
Patrick Naulleau ◽  
Jason P. Cain ◽  
Erik Anderson ◽  
Kim Dean ◽  
Paul Denham ◽  
...  
Keyword(s):  
Light Source ◽  
Extreme Ultraviolet ◽  
Numerical Aperture ◽  
Advanced Light Source

Extreme ultraviolet microexposures at the Advanced Light Source using the 0.3 numerical aperture micro-exposure tool optic

2004 ◽  
Vol 22 (6) ◽  
pp. 2962 ◽  
Author(s):  
Patrick P. Naulleau ◽  
Kenneth A. Goldberg ◽  
Erik Anderson ◽  
Jason P. Cain ◽  
Paul Denham ◽  
...  
Keyword(s):  
Light Source ◽  
Extreme Ultraviolet ◽  
Numerical Aperture ◽  
Advanced Light Source

Extreme Ultraviolet Lithography Capabilities at the Advanced Light Source Using a 0.3-NA Optic

2006 ◽  
Vol 42 (1) ◽  
pp. 44-50 ◽  
Author(s):  
P. Naulleau ◽  
K.A. Goldberg ◽  
J.P. Cain ◽  
E.H. Anderson ◽  
K.R. Dean ◽  
...  
Keyword(s):  
Light Source ◽  
Extreme Ultraviolet ◽  
Extreme Ultraviolet Lithography ◽  
Ultraviolet Lithography ◽  
Advanced Light Source

scholarly journals Wavefront Sensing for Evaluation of Extreme Ultraviolet Microscopy

Sensors ◽  
2020 ◽  
Vol 20 (22) ◽  
pp. 6426
Author(s):  
Mabel Ruiz-Lopez ◽  
Masoud Mehrjoo ◽  
Barbara Keitel ◽  
Elke Plönjes ◽  
Domenico Alj ◽  
...  
Keyword(s):  
Extreme Ultraviolet ◽  
Numerical Aperture ◽  
Laser Flash ◽  
Optical Systems ◽  
Wavefront Sensor ◽  
Reliable Technique ◽  
Phase Measurements ◽  
X Ray ◽  
Classical Calculation

Wavefront analysis is a fast and reliable technique for the alignment and characterization of optics in the visible, but also in the extreme ultraviolet (EUV) and X-ray regions. However, the technique poses a number of challenges when used for optical systems with numerical apertures (NA) > 0.1. A high-numerical-aperture Hartmann wavefront sensor was employed at the free electron laser FLASH for the characterization of a Schwarzschild objective. These are widely used in EUV to achieve very small foci, particularly for photolithography. For this purpose, Schwarzschild objectives require highly precise alignment. The phase measurements acquired with the wavefront sensor were analyzed employing two different methods, namely, the classical calculation of centroid positions and Fourier demodulation. Results from both approaches agree in terms of wavefront maps with negligible degree of discrepancy.

Calibration of a microchannel plate based extreme ultraviolet grazing incident spectrometer at the Advanced Light Source

2010 ◽  
Vol 81 (10) ◽  
pp. 10E313
Author(s):  
M. S. Bakeman ◽  
J. van Tilborg ◽  
T. Sokollik ◽  
D. Baum ◽  
N. Ybarrolaza ◽  
...  
Keyword(s):  
Light Source ◽  
Extreme Ultraviolet ◽  
Microchannel Plate ◽  
Advanced Light Source
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