X-ray photoelectron spectroscopic observation on B–C–N hybrids synthesized by ion beam deposition of borazine

2005 ◽  
Vol 23 (3) ◽  
pp. 497-502 ◽  
Author(s):  
Md. Nizam Uddin ◽  
Iwao Shimoyama ◽  
Yuji Baba ◽  
Tetsuhiro Sekiguchi ◽  
Masamitsu Nagano
Keyword(s):  
Ion Beam ◽  
Spectroscopic Observation ◽  
X Ray ◽  
Ion Beam Deposition ◽  
Beam Deposition

Ion Beam Deposition of Epitaxial Silicon Films

1997 ◽  
Vol 485 ◽  
Author(s):  
H. R. Khan ◽  
H. Frey
Keyword(s):  
Ion Beam ◽  
Silicon Films ◽  
Epitaxial Silicon ◽  
X Ray Diffraction ◽  
Ion Energy ◽  
X Ray ◽  
Ion Beam Deposition ◽  
Si Films ◽  
Silane Plasma ◽  
Beam Deposition

AbstractSilicon films of thicknesses (100 – 800 nm) are deposited on Si[111] substrate at 490°C using Si+ ions of energies (20 – 70 eV) from Silane plasma. The structure of the films depends on the energy of Si+ ions and the film grows epitaxially for ion energy <20 eV. Si films are analyzed by X-ray diffraction technique.

Ion Beam Deposition of Calcium Hydroxyapatite

1987 ◽  
Vol 110 ◽  
Author(s):  
B. L. Barthell ◽  
T. A. Archuleta ◽  
Ram Kossowsky
Keyword(s):  
Electron Microscopy ◽  
Ion Beam ◽  
Calcium Hydroxyapatite ◽  
X Ray Diffraction ◽  
X Ray ◽  
Adhesion Testing ◽  
Ion Beam Deposition ◽  
Argon Ion ◽  
Scanning Electron ◽  
Beam Deposition

AbstractCalcium hydroxyapatite has been sputtered on glass and Ti-6Al-4V substrates using a 1.5-kV argon ion beam. The films have been examined by x-ray diffraction analysis, energy dispersive spectroscopy, scanning electron microscopy, and adhesion testing. Results of this experimentation are presented.

Tem and X-Ray Investigation of Single Crystal-Like Zirconia Films Fabricated by Dual Ion Beam Deposition

1995 ◽  
Vol 396 ◽  
Author(s):  
Kevin G. Ressler ◽  
Neville Sonnenberg ◽  
Michael J. Cima
Keyword(s):  
Single Crystal ◽  
Quartz Substrate ◽  
Ion Beam ◽  
Film Plane ◽  
Film Structure ◽  
Cross Sectional ◽  
X Ray ◽  
Ion Beam Deposition ◽  
Amorphous Quartz ◽  
Beam Deposition

AbstractSingle crystal-like yttria-stabilized zirconia (YSZ) thin films have been deposited on amorphous quartz, polycrystalline zirconia, single crystal Si, and Hastelloy substrates using dual ion beam deposition (IBAD). These films are highly crystallographically aligned both normal to and within the film plane. The films are deposited at low substrate temperatures (<200°C), and the film orientation is substrate independent. θ-2θ X-ray diffraction, X-ray rocking curves, X-ray pole figures and X-ray phi scans are used to evaluate the film structure. High resolution cross-sectional TEM is used to examine the evolution of crystallographic film alignment on an amorphous quartz substrate. The data suggest that the evolution of biaxial alignment is nucleation controlled under these conditions.

Characterization of Films Made from Silicon Oil Saturated Methane Vapor by Ion Beam

1992 ◽  
Vol 279 ◽  
Author(s):  
Sin-Shong Lin ◽  
Janes M. Sloan
Keyword(s):  
Saturated Vapor ◽  
Ion Beam ◽  
Carbon Films ◽  
Amorphous Carbon Films ◽  
X Ray ◽  
Silicon Oil ◽  
Ion Beam Deposition ◽  
Steel Substrates ◽  
Beam Deposition

ABSTRACTAmorphous carbon films were prepared by the ion beam deposition of methane saturated with silicon pump oil 704. The concentration of Si in the ion deposited coatings could be varied by the temperature of silicon oil bath where saturated vapor was produced. In the process, the vapor ionized at 800 V was accelerated and impinged on glass or stainless steel substrates at ion densities between 0.3–1.5 mA/cm2 for a period of less than 60 minutes. The resulting films were characterized by x-ray photoelectron and Raman spectroscopies. The elemental components of these films include carbon, oxygen and silicon with varying amounts of nitrogen, iron and tungsten contaminations. The microstructure mainly consists of tiny graphitic carbon with sp2 ordered and disordered configurations, numerous carbon-oxygen and carbon-silicon linkages. This simple unique process yields a homogeneous thin coating suitable for many tribological applications.

scholarly journals Структурные особенности текстурированных пленок оксида цинка, полученных методом ионного распыления

2021 ◽  
Vol 55 (3) ◽  
pp. 230
Author(s):  
В.Г. Костишин ◽  
А.Ю. Миронович ◽  
А.В. Тимофеев ◽  
И.М. Исаев ◽  
Р.И. Шакирзянов ◽  
...  
Keyword(s):  
Ion Beam ◽  
Temperature Treatment ◽  
Zno Films ◽  
X Ray Diffraction ◽  
Polycrystalline Structure ◽  
Initial State ◽  
X Ray ◽  
Ion Beam Deposition ◽  
Diffraction Patterns ◽  
Beam Deposition

In this work, we studied textured ZnO films obtained by ion-beam deposition. X-ray diffraction patterns and micrographs of the surface revealed that asdeposited films have a polycrystalline structure. It was found that, after annealing of the samples in the temperature range from 200 ° C to 500 °, recrystallization occurs, leading to a change in the grain size and surface roughness. The dependence of the initial state of the film on the recrystallization intensity is also demonstrated. In films with an initially more perfect structure, temperature treatment at 500 ° C led to grain growth by more than 2 times and a decrease in roughness by ~ 40%.

Characterization and Reissue of SRM 2063 Thin-Film Glass Standard

1990 ◽  
Vol 48 (2) ◽  
pp. 436-437
Author(s):  
J. M. Phelps ◽  
E. B. Steel
Keyword(s):  
Thin Film ◽  
Cross Sections ◽  
Ion Beam ◽  
Sensitivity Factor ◽  
X Ray ◽  
Ion Beam Deposition ◽  
Commercial Laboratory ◽  
Ionization Cross Sections ◽  
Detector Configurations ◽  
Beam Deposition

X-ray energy-dispersive spectrometry (EDS) is an essential tool for chemical analysis .with an electron microscope. Quantification of an acquired spectrum is typically preformed using a “relative elemental sensitivity factor” or “k factor” approach. Because of differing instrumental and detector configurations, detector efficiencies and ionization cross sections, these sensitivity factors must be determined for individual instruments. SRM 2063 is the reissue of a thin film Standard Reference Material of known chemical composition, density, thickness, stability, and homogeneity to provide characteristic x-ray peak locations and intensities for elements in the 1 - 8 keV region. The experimental procedure utilizes several different techniques to characterize the samples and limit analytical bias.The original issue of SRM 2063 was produced by NIST personnel at a commercial laboratory using their ion beam deposition system. For the reissue of SRM 2063, a 10 cm diameter ion beam deposition system was acquired by NIST and used to sputter a fully characterized silicon, magnesium, calcium, and iron glass.

Ion Beam Deposition of Boron-Aluminum Nitride Thin Films

1995 ◽  
Vol 388 ◽  
Author(s):  
J.H. Edgar ◽  
C.R. Eddy ◽  
J.A. Sprague ◽  
B.D. Sartwell
Keyword(s):  
Thin Films ◽  
Aluminum Nitride ◽  
Electron Spectroscopy ◽  
Boron Content ◽  
Ion Beam ◽  
X Ray Diffraction ◽  
X Ray ◽  
Ion Beam Deposition ◽  
Ion Beam Assisted Deposition ◽  
Beam Deposition

AbstractAnalysis of the phase behavior, structure, and composition of aluminum nitride thin films with up to 22% boron prepared by ion-beam assisted deposition is presented. the c-lattice constant of the film decreased with increasing boron content as expected from the formation of an aIN - wurtzite BN alloy. there was no evidence for separate boron nitride precipitation from either X-ray diffraction or FTIR. IN contrast, auger electron spectroscopy of the boron present in the films suggested that two types of boron bonding was present.

Electron energy loss spectroscopy of diamond-like carbon thin films

1992 ◽  
Vol 50 (2) ◽  
pp. 1272-1273
Author(s):  
J. Kulik ◽  
Y. Lifshitz ◽  
G.D. Lempert ◽  
S. Rotter ◽  
J.W. Rabalais ◽  
...  
Keyword(s):  
Thin Films ◽  
Energy Loss ◽  
Electron Energy ◽  
Ion Beam ◽  
Diamond Like Carbon ◽  
Ion Beam Deposition ◽  
Chemistry Research ◽  
Carbon Thin Films ◽  
Electron Energy Loss ◽  
Beam Deposition

Carbon thin films with diamond-like properties have generated significant interest in condensed matter science in recent years. Their extreme hardness combined with insulating electronic characteristics and high thermal conductivity make them attractive for a variety of uses including abrasion resistant coatings and applications in electronic devices. Understanding the growth and structure of such films is therefore of technological interest as well as a goal of basic physics and chemistry research. Recent investigations have demonstrated the usefulness of energetic ion beam deposition in the preparation of such films. We have begun an electron microscopy investigation into the microstructure and electron energy loss spectra of diamond like carbon thin films prepared by energetic ion beam deposition.The carbon films were deposited using the MEIRA ion beam facility at the Soreq Nuclear Research Center in Yavne, Israel. Mass selected C+ beams in the range 50 to 300 eV were directed onto Si {100} which had been etched with HF prior to deposition.

Ion beam deposition of alumina for recording head applications

1995 ◽  
Vol 31 (6) ◽  
pp. 2694-2696 ◽  
Author(s):  
M. Tan ◽  
S.-I. Tan ◽  
Yong Shen
Keyword(s):  
Ion Beam ◽  
Recording Head ◽  
Ion Beam Deposition ◽  
Beam Deposition
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