Formation of catalytic and corrosion protective layers with use of ion beam assisted deposition of metals from vacuum arc discharge plasma

This paper presents a brief overview of our studies on the modification of materials using ion beam assisted deposition (IBAD) of metals from vacuum arc discharge plasma in order to form catalytically active and corrosion-resistant layers on the surface. Deposition of metals on different materials with simultaneous mixing of the deposited layer with the substrate surface by accelerated ions of the deposited metal was carried out in an experimental setup with a pulsed electric arc ion source. Catalytic and corrosion properties of the materials with the obtained layers were studied using electrochemical voltammetric measurements. The microstructure and composition of the resulting layers were studied using the SEM, EDX, WD-XRF, XPS, EBSD, and RBS methods.

Enhanced Hot Salt-Water Corrosion Resistance of NiCoCrAlY-AlSiY Coating by Ion-Beam-Assisted Deposition

A promising ion-beam-assisted deposition (IBAD) method was developed to improve the salt-water corrosion resistance of NiCoCrAlY-AlSiY coating. During hot salt-water exposure, hydrochloric acid (HCl) was produced when chloride salt, water, and metal oxide reacted with each other, while HCl was also produced when chlorine reacted with water. The as-deposited AlSiY layer exhibited a loose texture accompanied by numerous pore defects, which triggered the multi-scale diffusion of HCl, resulting in the large-area corrosion degradation of the coating texture and the rapid diffusion of the NiCoCrAlY bonding layer. By contrast, the ion-beam-assisted AlSiY layer showed a dense texture that effectively inhibited the inner diffusion of HCl and suppressed the corrosion reactions as well as the diffusion of the NiCoCrAlY bonding layer. The current results confirmed the significant potential of IBAD in inhibiting corrosion damage and diffusion of thermal protective coatings.

Optical and electrical properties of Ti-doped In2O3 film deposited on flexible transparent substrates by ion beam assisted deposition under different oxygen flow rate

A flexible transparent is an important technology to improve flexible electronic and flexible display devices. Actually, the deposition process of films coated on a flexible substrate will no more than 200 °C or room temperature. In order to achieve high transmission and lower resistivity, this paper reported the thin films of ITiO deposited by ion beam-assisted electron beam under the condition of different oxygen flow rates at room temperature. The electrical, optical, and morphological properties of ITiO films were investigated under the condition of different oxygen flow rates. At the 30 sccm oxygen flow rate, the surface roughness was 5.4 nm, high transmittance and optical bandgap of ITiO films were 89.2% at 470 nm wavelengths and 3.28 eV, respectively. The lowest resistivity of film was 2.1 × 10-4 Ω-cm at 30 sccm oxygen flow rate. Furthermore, the carrier concentration and hall mobility were experimentally investigated, which presented by 42.8 cm2/Vsec and 9.23 × 1020 cm-3. The use ITiO film coated on a flexible substrate with ion beam-assisted electron beam evaporation at room temperature can improve the lower resistivity and high transmission of the flexible device. It was also demonstrated that ITiO film with ion beam-assisted deposition technique is suitable for flexible electronic and flexible display devices.

Structural and Optical Characterization of Thermally Oxidized Titanium Thin Films Prepared by Ion Beam-assisted Deposition (IBAD) Technique

Titanium oxide (TiO2) thin films have been grown by thermal oxidation of sputtered Titanium (Ti) thin layers using ion beam-assisted deposition (IBAD). X-ray diffraction showed that prior to oxidation, the films are composed of hexagonal crystallites of Ti. After oxidation, a film structure transition occurs from monoclinic β-TiO2 type to tetragonal anatase type as the annealing temperature of Ti layer is increased from 250 °C to 550 °C. The film thickness was about 230 nm. Visualization and scanning by atomic force microscope (AFM) revealed a low roughness of the samples, which increases when the annealing temperature is increased. The optical transmittances of the films in the visible spectrum were in the range of 85-95%. The values of optical band gap have been estimated to be 3.43 eV and 3.61 eV, for thin films annealed at 250°C and 550°C, respectively. Keywords: TiO2 thin film, IBAD, XRD, structural and optical properties.