Characterization of methyl-doped silicon oxide film deposited using Flowfill™ chemical vapor deposition technology

2002 ◽  
Vol 20 (3) ◽  
pp. 828 ◽  
Author(s):  
Hongqiang Lu ◽  
Hao Cui ◽  
Ishwara Bhat ◽  
Shyam Murarka ◽  
Williams Lanford ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Oxide Film ◽  
Vapor Deposition ◽  
Silicon Oxide ◽  
Chemical Vapor ◽  
Silicon Oxide Film ◽  
Doped Silicon ◽  
Deposition Technology

Self-limiting chemical vapor deposition of an ultra-thin silicon oxide film using tri-(tert-butoxy)silanol

2001 ◽  
Vol 397 (1-2) ◽  
pp. 78-82 ◽  
Author(s):  
K.A. Miller ◽  
C. John ◽  
K.Z. Zhang ◽  
K.T. Nicholson ◽  
F.R. McFeely ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Oxide Film ◽  
Vapor Deposition ◽  
Silicon Oxide ◽  
Chemical Vapor ◽  
Silicon Oxide Film ◽  
Thin Silicon

Plasma-assisted chemical vapor deposition and characterization of high quality silicon oxide films

1990 ◽  
Vol 193-194 ◽  
pp. 595-609 ◽  
Author(s):  
S.V Nguyen ◽  
D Dobuzinsky ◽  
D Dopp ◽  
R Gleason ◽  
M Gibson ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Silicon Oxide ◽  
Oxide Films ◽  
Chemical Vapor ◽  
High Quality
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