Study of oxygen influences on carbon doped silicon oxide low k thin films deposited by plasma enhanced chemical vapor deposition

2004 ◽  
Vol 96 (1) ◽  
pp. 829-834 ◽  
Author(s):  
M. R. Wang ◽  
Rusli ◽  
J. L. Xie ◽  
N. Babu ◽  
C. Y. Li ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Silicon Oxide ◽  
Chemical Vapor ◽  
Carbon Doped ◽  
Doped Silicon ◽  
Low K

Characterization of Carbon-Doped SiO[sub 2] Low k Thin Films: Preparation by Plasma-Enhanced Chemical Vapor Deposition from Tetramethylsilane

2001 ◽  
Vol 148 (7) ◽  
pp. F148 ◽  
Author(s):  
Licheng M. Han ◽  
Ji-Sheng Pan ◽  
Shou-Mian Chen ◽  
N. Balasubramanian ◽  
Jianou Shi ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Carbon Doped ◽  
Low K

Nanoscale disorder in high critical field, carbon-doped MgB2 hybrid physical-chemical vapor deposition thin films

2007 ◽  
Vol 91 (8) ◽  
pp. 082513 ◽  
Author(s):  
Y. Zhu ◽  
D. C. Larbalestier ◽  
P. M. Voyles ◽  
A. V. Pogrebnyakov ◽  
X. X. Xi ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Critical Field ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Carbon Doped ◽  
Physical Chemical ◽  
Doped Mgb2

Carbon-Doped<tex>$rm MgB_2$</tex>Thin Films Grown by Hybrid Physical-Chemical Vapor Deposition

2005 ◽  
Vol 15 (2) ◽  
pp. 3321-3324 ◽  
Author(s):  
A.V. Pogrebnyakov ◽  
J.M. Redwing ◽  
J.E. Giencke ◽  
C.B. Eom ◽  
V. Vaithyanathan ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Carbon Doped ◽  
Physical Chemical
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