Effects of helium dilution of TEOS–O2–C2F6 gas mixture on plasma-enhanced chemical vapor deposition of fluorine-doped silicon oxide film

1999 ◽  
Vol 17 (2) ◽  
pp. 425-432 ◽  
Author(s):  
Masaki Yoshimaru ◽  
Satoshi Koizumi ◽  
Kimiaki Shimokawa ◽  
Y. Mori ◽  
H. Fukuda ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Oxide Film ◽  
Vapor Deposition ◽  
Silicon Oxide ◽  
Chemical Vapor ◽  
Gas Mixture ◽  
Silicon Oxide Film ◽  
Doped Silicon ◽  
Helium Dilution

Self-limiting chemical vapor deposition of an ultra-thin silicon oxide film using tri-(tert-butoxy)silanol

2001 ◽  
Vol 397 (1-2) ◽  
pp. 78-82 ◽  
Author(s):  
K.A. Miller ◽  
C. John ◽  
K.Z. Zhang ◽  
K.T. Nicholson ◽  
F.R. McFeely ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Oxide Film ◽  
Vapor Deposition ◽  
Silicon Oxide ◽  
Chemical Vapor ◽  
Silicon Oxide Film ◽  
Thin Silicon
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