Measurement of Microprocessor Die Stress due to Thermal Cycling, Power Cycling, and Second Level Assembly

2013 ◽  
Author(s):  
Jordan C. Roberts ◽  
Mohammad Motalab ◽  
Safina Hussain ◽  
Jeffrey C. Suhling ◽  
Richard C. Jaeger ◽  
...  
Keyword(s):  
Thermal Cycling ◽  
Flip Chip ◽  
Thermal Power ◽  
Three Dimensional ◽  
Power Cycling ◽  
Die Stress ◽  
Test Chips ◽  
Resistance Data ◽  
Critical Locations

In the current work, we have extended our past studies on Flip Chip Ceramic Ball Grid Array (FC-BGA) microprocessor packaging configurations to investigate in-situ die stress variation during thermal and power cycling. The utilized (111) silicon sensor rosettes were able to measure the complete three-dimensional stress state (all 6 stress components) at each sensor site being monitored by the data acquisition hardware. The test chips had dimensions of 20 × 20 mm, and 3600 lead free solder interconnects (full area array) were used to connect the chips to high CTE ceramic chip carriers. A unique package carrier was developed to allow measurement of the die stresses in the FC-CBGA components under thermal and power cycling loads without inducing any additional mechanical loadings. Initial experiments consisted of measuring the die stress levels while the components were subjected to a slow (quasi-static) temperature changes from 0 to 100 C. In later testing, long term thermal cycling of selected parts was performed from 0 to 100 C (40 minute cycle, 10 minute ramps and dwells). After various durations of cycling, the sensor resistances at critical locations on the die device surface (e.g. die center and die corners) were recorded. From the resistance data, the stresses at each site were calculated and plotted versus time. Finally, thermal and power cycling of selected parts was performed, and in-situ measurements of the transient die stress variations were performed. Power cycling was implemented by exciting the on-chip heaters on the test chips with various power levels. During the thermal/power cycling, sensor resistances at critical locations on the die device surface (e.g. die center and die corners) were recorded continuously. From the resistance data, the stresses at each site were calculated and plotted versus time.

Characterization of Die Stress Distributions in Area Array Flip Chip Packaging

2009 ◽  
Author(s):  
Jordan Roberts ◽  
M. Kaysar Rahim ◽  
Jeffrey C. Suhling ◽  
Richard C. Jaeger ◽  
Pradeep Lall ◽  
...  
Keyword(s):  
Thermal Cycling ◽  
Flip Chip ◽  
Thermal Power ◽  
Temperature Cycling ◽  
Aging Effects ◽  
Area Array ◽  
Power Cycling ◽  
Die Stress ◽  
On Chip ◽  
Test Chips

On-chip piezoresistive stress sensors represent a unique approach for characterizing stresses in silicon die embedded within complicated packaging architectures. In this work, we have used test chips containing such sensors to measure the stresses induced in microprocessor die after various steps of the assembly process, as well as to continuously characterize the in-situ die surface stress during thermal cycling and power cycling. The utilized (111) silicon sensor rosettes were able to measure the complete three-dimensional stress state (all 6 stress components) at each sensor site being monitored by the data acquisition hardware. The test chips had dimensions of 20 × 20 mm, and 3600 lead free solder interconnects (full area array) were used to connect the chips to high CTE ceramic chip carriers. Before packaging, the sensor resistances were measured by directly probing the test chip wafers. The chips were then diced, reflowed to the ceramic substrate, and then underfilled and cured. Finally, a metallic lid was attached to complete the ceramic LGA package. After every packaging step (solder reflow, underfill dispense and cure, lid attachment and adhesive cure), the sensor resistances were re-measured, so that the die stresses induced by each assembly operation could be characterized. The build-up of the die stresses was found to be monotonically increasing, and the relative severity of each assembly step was judged and compared. Such an approach also allows for various material sets (solders, underfills, TIM materials, lid metals, and lid adhesives) to be analyzed and rated for their contribution to the die stress level. After first level packaging of the chips on the ceramic chip carriers, initial experiments have been performed to analyze the effects of thermal cycling and power cycling on the die stresses. Thermal cycling of selected parts was performed from 0 to 100 C (40 minute cycle, 10 minute ramps and dwells). Power cycling of selected parts was performed by exciting the on-chip heaters on the test chips with power levels typical of microprocessor die. During the thermal/power cycling, sensor resistances at critical locations on the die device surface (e.g. die center and die corners) were recorded continuously. From the resistance data, the stresses at each site were calculated and plotted versus time. The experimental observations show some cycle-to-cycle evolution in the stress magnitudes due to material aging effects, stress relaxation and creep phenomena, and development of interfacial damage. The observed stress variations as a function of temperature cycling duration are currently being correlated with the delaminations occurring at the interfaces between the die and underfill and the die and lid adhesive. In addition, finite element models of the packages are being developed and correlated with the data.

Die Stress Variation During Thermal Cycling Reliability Tests

2007 ◽  
Author(s):  
M. Kaysar Rahim ◽  
Jordan Roberts ◽  
Jeffrey C. Suhling ◽  
Richard C. Jaeger ◽  
Pradeep Lall
Keyword(s):  
Thermal Cycling ◽  
Electronic Packaging ◽  
Room Temperature ◽  
Flip Chip ◽  
Constitutive Relations ◽  
Temperature Cycling ◽  
Material Behavior ◽  
Aging Effects ◽  
Test Chips

Thermal cycling accelerated life testing is an established technique for thermo-mechanical evaluation and qualification of electronic packages. Finite element life predictions for thermal cycling configurations are challenging due to several reasons including the complicated temperature/time dependent constitutive relations and failure criteria needed for solders, encapsulants and their interfaces; aging/evolving material behavior for the packaging materials (e.g. solders); difficulties in modeling plating finishes; the complicated geometries of typical electronic assemblies; etc. In addition, in-situ measurements of stresses and strains in assemblies subjected to temperature cycling are difficult because of the extreme environmental conditions and the fact that the primary materials/interfaces of interest (e.g. solder joints, die device surface, wire bonds, etc.) are embedded within the assembly (not at the surface). For these reasons, little is known about the evolution of the stresses, strains, and deformations occurring within sophisticated electronic packaging geometries during thermal cycling. In this work, we have used test chips containing piezoresistive stress sensors to characterize the in-situ die surface stress during long-term thermal cycling of electronic packaging assemblies. Using (111) silicon test chips, the complete three-dimensional stress state (all 6 stress components) was measured at each rosette site by monitoring the resistance changes occurring in the sensors. The packaging configuration studied in this work was flip chip on laminate where 5 × 5 mm perimeter bumped die were assembled on FR-406 substrates. Three different thermal cycling temperature profiles were considered. In each case, the die stresses were initially measured at room temperature after packaging. The packaged assemblies were then subjected to thermal cycling and measurements were made either incrementally or continuously during the environmental exposures. In the incremental measurements, the packages were removed from the chamber after various durations of thermal cycling (e.g. 250, 500, 750, 1000 cycles, etc.), and the sensor resistances were measured at room temperature. In the continuous measurements, the sensor resistances at critical locations on the die device surface (e.g. die center and die corners) were recorded continuously during the thermal cycling exposure. From the resistance data, the stresses at each site were calculated and plotted versus time. The experimental observations show cycle-to-cycle evolution in the stress magnitudes due to material aging effects, stress relaxation and creep phenomena, and development of interfacial damage.

Stresses in Area Array Assemblies Subjected to Thermal Cycling

2009 ◽  
Author(s):  
Jordan Roberts ◽  
M. Kaysar Rahim ◽  
Safina Hussain ◽  
Jeffrey C. Suhling ◽  
Richard C. Jaeger ◽  
...  
Keyword(s):  
Finite Element ◽  
Thermal Cycling ◽  
Flip Chip ◽  
Ball Grid Array ◽  
Temperature Cycling ◽  
Aging Effects ◽  
Area Array ◽  
Die Surface ◽  
Test Chips

Thermal cycling accelerated life testing is often used to qualify area array packages (e.g. Ball Grid Arrays and Flip Chip) for various applications. Finite element life predictions for thermal cycling configurations are challenging due to the complicated temperature/time dependent constitutive relations and failure criteria needed for solders and encapsulants and their interfaces, aging/evolving material behavior (e.g. solders), difficulties in modeling plating finishes, the complicated geometries of typical electronic assemblies, etc. In addition, in-situ measurements of stresses and strains in assemblies subjected to temperature cycling is difficult because of the extreme environmental conditions and the fact that the primary materials/interfaces of interest (e.g. solder joints, die device surface, wire bonds, etc.) are embedded within the assembly (not at the surface). For these reasons, we really know quite little about the evolution of the stresses, strains, and deformations occurring within sophisticated electronic packaging geometries during thermal cycling. In our research, we are using test chips containing piezoresistive stress sensors to continuously characterize the in-situ die surface stress during long-term thermal cycling of several different area array packaging technologies including plastic ball grid array (PBGA) components, ceramic ball grid array (CBGA) components, and flip chip on laminate assemblies. The utilized (111) silicon test chips are able to measure the complete three-dimensional stress state (all 6 stress components) at each sensor site being monitored by the data acquisition hardware. The die stresses are initially measured at room temperature after packaging. The assemblies are then subjected to thermal cycling over various temperature ranges including 0 to 100 °C, −40 to 125 °C, and −55 to 125 °C, for up to 3000 thermal cycles. During the thermal cycling, sensor resistances at critical locations on the die device surface (e.g. the die center and die corners) are recorded. From the resistance data, the stresses at each site can be calculated and plotted versus time. The experimental observations show significant cycle-to-cycle evolution in the stress magnitudes due to material aging effects, stress relaxation and creep phenomena, and development of interfacial damage. The observed stress variations as a function of thermal cycling duration are also being correlated with the observed delaminations at the die surface (as measured using scanning acoustic microscopy (C-SAM)) and finite element simulations that include material constitutive models that incorporate thermal aging effects.

Piezoresistive Stress Sensors for Structural Analysis of Electronic Packages

1991 ◽  
Vol 113 (3) ◽  
pp. 203-215 ◽  
Author(s):  
D. A. Bittle ◽  
J. C. Suhling ◽  
R. E. Beaty ◽  
R. C. Jaeger ◽  
R. W. Johnson
Keyword(s):  
Integrated Circuit ◽  
Structural Reliability ◽  
Lattice Structure ◽  
Three Dimensional ◽  
Electronic Packages ◽  
Cubic Symmetry ◽  
Piezoresistive Sensors ◽  
Stress Sensors ◽  
Die Stress ◽  
Test Chips

Structural reliability of electronic packages has become an increasing concern for a variety of reasons including the advent of higher integrated circuit densities, power density levels, and operating temperatures. A powerful method for experimental evaluation of die stress distributions is the use of test chips incorporating integral piezoresistive sensors. In this paper, the theory of conduction in piezoresistive materials is reviewed and the basic equations applicable to the design of stress sensors on test chips are presented. General expressions are obtained for the stress-induced resistance changes which occur in arbitrarily oriented one-dimensional filamentary conductors fabricated out of crystals with cubic symmetry and diamond lattice structure. These relations are then applied to obtain basic results for stressed in-plane resistors fabricated into the surface of (100) and (111) oriented silicon wafers. Sensor rosettes developed by previous researchers for each of these wafer orientations are reviewed and more powerful rosettes are presented along with the equations needed for their successful application. In particular, a new sensor rosette fabricated on (111) silicon is presented which can measure the complete three-dimensional stress state at points on the surface of a die

High Reliability Flip Chip Using Low CTE Laminate Substrates

2005 ◽  
Author(s):  
D. Scott Copeland ◽  
M. Kaysar Rahim ◽  
Jeffrey C. Suhling ◽  
Guoyun Tian ◽  
Pradeep Lall ◽  
...  
Keyword(s):  
Carbon Fiber ◽  
Thermal Cycling ◽  
Flip Chip ◽  
Experimental Testing ◽  
High Reliability ◽  
Low Cost ◽  
Substrate Material ◽  
Space Applications ◽  
Sandwich Construction ◽  
Test Chips

In this work, we report on our efforts to develop high reliability flip chip on laminate assemblies for deployment in harsh thermal cycling environments characteristic of ground and aerospace vehicles (e.g. −55 to 150 °C). Reliability enhancement has been achieved through the use of a novel low expansion, high stiffness, and relatively low cost laminate substrate material that virtually eliminates CTE mismatches between the silicon die and top layer PCB interconnect. The utilized laminate features a sandwich construction that contains standard FR-406 outer layers surrounding a low expansion high thermal conductivity carbon fiber-reinforced composite core (STABLCOR®). Through both experimental testing and modeling, we have demonstrated that robust flip chip assemblies can be produced that illustrate ultra-high solder joint reliability during thermal cycling and extremely low die stresses. Liquid to liquid thermal shock testing has been performed on test assemblies incorporating daisy chain test die, and piezoresistive test chips have been used to characterize temperature dependent die stresses. In both sets of experiments, results obtained using the hybrid PCB laminate with FR-406 outer layers and carbon fiber core have been compared to those obtained with more traditional glass-epoxy laminate substrates including FR-406 and NELCO 4000-13. Nonlinear finite element modeling results for the low expansion flip chip on laminate assemblies have been correlated with the experimental data. Unconstrained thermal expansion measurements have also been performed on the hybrid laminate materials using strain gages to demonstrate their low CTE characteristics. Other experimental testing has demonstrated that the new laminate successfully passes toxicity, flammability, and vacuum stability testing as required for pressurized and un-pressurized space applications.

Measurement of Stress and Delamination in Flip Chip on Laminate Assemblies

2003 ◽  
Author(s):  
M. Kaysar Rahim ◽  
Jeffrey C. Suhling ◽  
D. Scott Copeland ◽  
Richard C. Jaeger ◽  
Pradeep Lall
Keyword(s):  
Flip Chip ◽  
Acoustic Microscopy ◽  
Valuable Insight ◽  
Stress Distributions ◽  
Environmental Testing ◽  
Stress Measurements ◽  
Piezoresistive Sensors ◽  
Die Stress ◽  
Test Chips ◽  
Stress Variations

Mechanical stress distributions in packaged silicon die that have resulted during assembly or environmental testing can be accurately characterized using test chips incorporating integral piezoresistive sensors. In this paper, an overview of recent measurements made in flip chip on laminate assemblies with (111) silicon test chips is presented. Transient die stress measurements have been made during underfill cure, and the room temperature die stresses in final cured assemblies have been compared for several different underfill encapsulants. The experimental stress measurements in the flip chip samples were then correlated with finite element predictions for the tested configurations. In addition, stress variations have been monitored in the assembled flip chip die as the test boards were subjected to slow temperature changes from −40 to +150°C. Finally the stress variations occurring during thermal cycling from −40 to +125°C have been characterized. These measurements have been correlated with the delaminations occurring at the die passivation to underfill interface measured using C-mode Scanning Acoustic Microscopy (C-SAM). Using the measurements and numerical simulations, valuable insight has been gained on the effects of assembly variables and underfill material properties on the reliability of flip chip packages.

Evolution of Die Stress and Delamination During Thermal Cycling of Flip Chip Assemblies

2005 ◽  
Author(s):  
M. Kaysar Rahim ◽  
Jeffrey C. Suhling ◽  
Richard C. Jaeger ◽  
Pradeep Lall
Keyword(s):  
Solder Joint ◽  
Thermal Cycling ◽  
Flip Chip ◽  
Three Dimensional ◽  
Shear Stresses ◽  
Thermal Cycles ◽  
Surface Stresses ◽  
Stress Changes ◽  
Die Surface ◽  
Delamination Propagation

Underfill encapsulation is used with flip chip die assembled to laminate substrates to distribute and minimize the solder joint strains, thus improving thermal cycling fatigue life. Any delaminations that occur at the underfill/die interface will propagate to the neighboring solder bumps and lead to solder joint fatigue and failure. The onset and propagation of delaminations in flip chip assemblies exposed to thermal cycling are governed by the cyclic stresses and damage occurring at the underfill to die interface. For this reason, underfills are optimized by increasing their adhesion strength, interfacial fracture toughness, and resistance to thermal aging. In this work, we have sought to develop a fundamental understanding of delamination initiation and growth in flip chip assemblies through simultaneous characterization of the stress and delamination states at the die to underfill interface. Mechanical stresses on the device side of the flip chip die have been measured using special (111) silicon stress test chips containing piezoresistive sensor rosettes that are capable of measuring the complete three-dimensional silicon surface stress state in the silicon (including the interfacial shear and normal stresses at the die to underfill interface). By continuous monitoring of the sensor resistances, the die surface stresses were measured during post-assembly thermal cycling environmental testing from −40 to 125 C. With this approach, the stress distributions across the chip, and the stress variations at particular locations at the die to underfill interface have been interrogated for the entire life of the flip chip assembly. In order to correlate the stress changes at the sensor sites with delamination onset and propagation, CSAM evaluation of the test assemblies was performed after every 125 thermal cycles. A total of 75 flip chip assemblies with 3 different underfills have been evaluated. For each assembly, the complete histories of three-dimensional die surface stresses and delamination propagation have been recorded versus the number of thermal cycles. Through these measurements, we have been able to identify the stress histories that lead to delamination initiation for each underfill encapsulant, and the variation of the stresses that occur before and during delamination propagation. The progressions of stress and delamination have been mapped across the entire surface of the die, and a series of stress/delamination videos have been produced. One of the most important discoveries is that the shear stresses occurring at the corners of flip chip die have been demonstrated to be a suitable proxy for prognostic determination of future delamination initiations and growth.

Characterization of Die Stresses in CBGA Packages due to Component Assembly and Heat Sink Clamping

2011 ◽  
Author(s):  
Jordan C. Roberts ◽  
Mohammad Motalab ◽  
Safina Hussain ◽  
Jeffrey C. Suhling ◽  
Richard C. Jaeger ◽  
...  
Keyword(s):  
Heat Sink ◽  
Flip Chip ◽  
Solder Joints ◽  
Ceramic Substrate ◽  
Lead Free ◽  
Lead Free Solder ◽  
Solder Interconnects ◽  
Die Stress ◽  
Free Solder ◽  
Test Chips

Microprocessor packaging in modern workstations and servers often consists of one or more large flip chip die that are mounted to a high performance ceramic chip carrier. The final assembly configuration features a complex stack up of flip chip area array solder interconnects, underfill, ceramic substrate, lid, heat sink, thermal interface materials, second level CBGA solder joints, organic PCB, etc., so that a very complicated set of loads is transmitted to the microprocessor chip. Several trends in the evolution of this packaging architecture have exacerbated die stress levels including the transition to larger die, high CTE ceramic substrates, lead free solder joints, higher levels of power generation, and larger heat sinks with increased clamping forces. Die stress effects are of concern due to several reasons including degradation of silicon device performance (mobility/speed), damage that can occur to the copper/low-k top level interconnect layers, and potential mechanical failure of the silicon in extreme cases. In this work, we have used test chips containing piezoresistive sensors to measure the buildup of mechanical stresses in a microprocessor die after various steps of the CBGA assembly process, as well as due to heat sink clamping. The developed normal stresses are compressive (triaxial compression) across the die surface, with significant in-plane and out-of-plane (interfacial) shear stresses also present at the die corners. The compressive stresses have been found to increase with each assembly step (flip chip solder joint reflow, underfill dispense and cure, lid attachment, CBGA assembly to PCB, and heat sink clamping). Levels exceeding 500 MPa have been observed for extremely high heat sink clamping forces. The utilized (111) silicon test chips were able to measure the complete three-dimensional stress state (all 6 stress components) at each sensor site being monitored by the data acquisition hardware. The test chips had dimensions of 20 × 20 mm, and 3600 lead free solder interconnects (full area array) were used to connect the chips to the high CTE ceramic chip carriers. Before packaging, the sensor resistances were measured by directly probing the individual test chip wafers. The chips were then diced, reflowed to the ceramic substrate, and then underfilled and cured. A metallic lid and second level solder balls were attached to complete the flip chip ceramic BGA components. After every packaging step (flip chip solder ball reflow, underfill dispense and cure, lid attachment and adhesive cure), the sensor resistances were re-measured, so that the die stresses induced by each assembly operation could be characterized. Finally, CBGAs with the stress sensing chips were soldered to organic PCB test boards. A simulated heat sink loading was then applied, and the stresses were measured as a function of the clamping force. The heat sink clamping pressure distribution was monitored using in-situ resistive sensors in the TIM2 position between the lid and heat sink. The measured stress changes due to heat sink clamping where correlated with finite element simulations. With suitable detail in the models, excellent correlation has been obtained.

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