A 180 nm copper/low-k CMOS technology with dual gate oxide optimized for low power and low cost consumer wireless applications
Keyword(s):
Low Cost
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2003 ◽
Vol 42
(Part 1, No. 4B)
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pp. 1892-1896
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2017 ◽
Vol 65
(12)
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pp. 5251-5262
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2012 ◽
Vol 21
(04)
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pp. 1250028
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Keyword(s):