Microarchitecture soft error vulnerability characterization and mitigation under 3D integration technology

Author(s):  
Wangyuan Zhang ◽  
Tao Li
2011 ◽  
Vol 35 (4) ◽  
pp. 371-381 ◽  
Author(s):  
Hongbin Sun ◽  
Pengju Ren ◽  
Nanning Zheng ◽  
Tong Zhang ◽  
Tao Li

2014 ◽  
Vol 2014 (DPC) ◽  
pp. 1-35
Author(s):  
Robert Patti

This publication will cover Tezzaron's latest advancements in 2.5D and 3D technology including new wafer to wafer integration of InP and GaAs with CMOS devices and new work in bonded die to wafer assembly with sub 25um pitch. A manufacturing perspective of the evolving customer requirements and the unique challenges in testing these highly complex devices will be discussed.


Author(s):  
Alesandro Cevrero ◽  
Panagiotis Athanasopoulos ◽  
Hadi Parandeh-Afshar ◽  
Maurizio Skerlj ◽  
Philip Brisk ◽  
...  

2015 ◽  
Vol 12 (7) ◽  
pp. 20152001-20152001 ◽  
Author(s):  
Mitsumasa Koyanagi

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