Assembly process and reliability assessment of TSV/RDL/IPD interposer with multi-chip-stacking for 3D IC integration SiP

Author(s):  
Chau-Jie Zhan ◽  
Pei-Jer Tzeng ◽  
John H. Lau ◽  
Ming-Ji Dai ◽  
Heng-Chieh Chien ◽  
...  
2012 ◽  
Vol 2012 (DPC) ◽  
pp. 001373-001393 ◽  
Author(s):  
Karthikeyan Dhandapani ◽  
Ahmer Syed ◽  
Wei Lin ◽  
Mark Nakamoto ◽  
Wei Zhao ◽  
...  

Chip-Package Interaction (CPI) is a significant concern for modern electronic devices and this concern is magnified for 3D Stacked IC. Hard bumps, soft dielectrics, thin die and complex geometries of the stacked die require an ability to model and evaluate the interactions and risks. In packaged IC, dissimilar materials along with the thermal history during the assembly process results in significant residual stresses. These stresses can impact process yields, reliability and die electrical performance. Examples of these effects are ball cracking, ILD/ELK cracking or delamination and shifts in the behavior of sensitive devices such as transistors in analog circuits. Traditionally modeling and evaluation of these risks have been handled by different groups/companies (foundry, OSAT, Fabless Device Mfg) and have been hindered by the difficulty of using different tools and more importantly collaborating without revealing proprietary models and process information/recipes. In this paper we present a modeling flow which incorporates a seamless interface between the tools traditionally used for both package and silicon modeling. This is accomplished by utilizing Boundary Conditions (BC's) to act as a hand-off between the two simulation tools. A package level modeling approach is developed incorporating package assembly processes to predict residual stresses at the end of package assembly process. This package level simulator uses a nested sub-modeling approach for detailed extraction of stresses at different locations within BEOL layers of die, u-bumps, and C4 bumps from package level simulations. Additionally, it allows complete flexibility in selecting boundaries at chip-package interface and then the extraction of BC's necessary for die and transistor level simulations. These boundaries for Chip-Package Interaction are selected by the device manufacturer and the output from this simulation is fed into device level simulations. To provide flexibility for the user and to attain quick turnaround time, a web hosted interface is enabled to run package simulations online. The capabilities of this modeling approach are demonstrated by studying the impact of design and material parameters on stresses at various interconnect structures constituting a typical 3D IC stack package. An example of active silicon layer stress correlation from package level model and die-level model will be presented, thus validating this overall modeling flow.


Author(s):  
Ching-Kuan Lee ◽  
Tao-Chih Chang ◽  
Yu-Jiau Huang ◽  
Huan-Chun Fu ◽  
Jui-Hsiung Huang ◽  
...  
Keyword(s):  

2010 ◽  
Vol 2010 (1) ◽  
pp. 000170-000175
Author(s):  
Zhongping Bao ◽  
James Burrell

Mechanical reliability issues in electronic packages have drawn significant attention in semiconductor industry for decades and have increased product development cost significantly. Recent rapid growth of various portable electronic devices like smartphone and smartbook with increasing demand for more functionality in tighter space further challenges the limit of mechanical reliability. To reduce the product development cost and time-to-market, mechanical simulation has been extensively employed in semiconductor industry for the purpose of design optimization and reliability assessment. The importance of having the correct simulation methodology can't be overemphasized considering the extent of its utilization throughout the product development cycle. In this paper, we will discuss three fundamental mechanical modeling methodologies that are widely used for simulating flip-chip overmolded packages. These approaches are generally used to simulate package warpage at End-of-Line (EOL) as well as to assess package reliability from a stress point of view. The first approach we studied in this paper is to assume that the package is initially stress-free at a given uniform temperature, which is usually taken to be the peak temperature of the mold cure profile. However, this differs from the actual assembly process where package composition and cure profiles are different at each assembly processing step. The second approach simply accounts for that fact and assigns different stress-free temperature to each individual package component. For example, the die is assumed to be stress-free at the chip attach temperature and substrate is assumed to be stress-free instead at the substrate baking temperature. This approach captures more physics compared to the first approach. The last approach explores that idea further by simulating the actual assembly process, step by step, through element removal and addition techniques available in the software. Such study is also carried out for a flip-chip overmolded package with Through-Silicon-Stacking (TSS) technology. Both Die-to-Die-first (D2D) and Die-to-Substrate-first (D2S) processes are examined. Simulated warpage, as well as reliability assessment regarding different failure mechanisms using these three modeling methodologies are discussed in detail. The paper is prepared to the best knowledge of authors and those statements do not necessarily reflect opinions of Qualcomm Inc. Some data shared in this paper is normalized such that no commercial confidential information is published.


Author(s):  
Yu-Min Lin ◽  
Chau-Jie Zhan ◽  
Zhi-Cheng Hsiao ◽  
Huan-Chun Fu ◽  
Ren-Shin Cheng ◽  
...  
Keyword(s):  

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