New composite organic dielectric for high performance flip chip single chip packages

Author(s):  
J.E. Korleski ◽  
R.E. Gorrell ◽  
C.P. Bowen ◽  
D.B. Noddin
1995 ◽  
Vol 7 (5) ◽  
pp. 476-478 ◽  
Author(s):  
D. Leclerc ◽  
P. Brosson ◽  
F. Pommereau ◽  
R. Ngo ◽  
P. Doussiere ◽  
...  

2019 ◽  
Vol 2019 (1) ◽  
pp. 000438-000443 ◽  
Author(s):  
Joseph Meyer ◽  
Reza Moghimi ◽  
Noah Sturcken

Abstract The generational scaling of CMOS device geometries, as predicted by Moore's law, has significantly outpaced advances in CMOS package and power electronics technology. The conduction of power to a high-performance integrated circuit (IC) die typically requires close to 50% of package and IC I/O and is increasing with trends towards lower supply voltages and higher power density that occur in advanced CMOS nodes. The disparity in scaling of logic, package, and I/O technology has created a significant bottleneck that has become a dominant constraint on computational performance. By performing power conversion and voltage regulation in-package, this limitation can be mitigated. Integration of thin-film ferromagnetic inductors with CMOS technology enables single-chip power converters to be co-packaged with processors, high bandwidth memory (HBM), and/or other modules. This paper highlights the advantages of fully integrated package voltage regulators (PVRs), which include: reducing package I/O allocated for power, eliminating the need for upstream power-conversion stages, and improving transient response. These benefits substantially reduce the size, weight, and power of modern electronic systems.


2018 ◽  
Vol 2018 (1) ◽  
pp. 000125-000128
Author(s):  
Ruby Ann M. Camenforte ◽  
Jason Colte ◽  
Richard Sumalinog ◽  
Sylvester Sanchez ◽  
Jaimal Williamson

Abstract Overmolded Flip Chip Quad Flat No-lead (FCQFN) is a low cost flip chip on leadframe package where there is no need for underfill, and is compatible with Pb free or high Pb metallurgy. A robust leadframe design, quality solder joint formation and an excellent molding process are three factors needed to assemble a high performance FCQFN. It combines the best of both wirebonded QFN and wafer chip scale devices. For example, wafer chip scale has low resistance, but inadequate thermal performance (due to absence of thermal pad), whereas wirebonded QFN has good thermal performance (i.e., heat dissipated through conductive die attach material, through the pad and to the board) but higher resistance. Flip chip QFN combines both positive aspects – that is: low resistance and good thermals. One of the common defects for molded packages across the semiconductor industry is the occurrence of mold voiding as this can potentially affect the performance of a device. This paper will discuss how mold voiding is mitigated by understanding the mold compound behavior on flip chip QFN packages. Taking for example the turbulent mold flow observed on flip chip QFN causing mold voids. Mold compound material itself has a great contribution to mold voids, hence defining the correct attributes of the mold compound is critical. Altering the mold compound property to decrease the mold compound rheology is a key factor. This dynamic interaction between mold compound and flip chip QFN package configuration is the basis for a series of design of experiments using a full factorial matrix. Key investigation points are establishing balance in mold compound chemistry allowing flow between bump pitch, as well as the mold compound rheology, where gelation time has to be properly computed to allow flow across the leadframe. Understanding the flow-ability of mold compound for FCQFN, the speed of flow was optimized to check on its impact on mold voids. Mold airflow optimization is also needed to help fill in tighter bump spacing but vacuum-on time needs to be optimized as well.


2008 ◽  
Vol 5 (3) ◽  
pp. 104-115
Author(s):  
Dennis Leung ◽  
Guna Selvaduray

Microvia failures in flip chip ball grid array (FCBGA) polymeric substrates have been a major concern in the development of reliable packages for high-performance and high-density chips. To determine the relationship between reliability and design factors of the microvias, a 10-layer substrate was used to investigate these contrasting design factors: “stack-on-core” vs. “non–stack-on-core,” “high” vs. “low” aspect ratio, “stacked” vs. “staggered,” and “fillet” vs. “non-fillet.” Temperature cycling was used to generate stresses on the microvias. Electrical resistance was measured and analyzed, using design of experiment (DOE), to determine the effects of these design factors on microvia reliability. The significant single factors for a robust microvia were “non–stack-on-core” and “staggered.” Cross-sectioning was employed to understand the failure pattern. Cracks occurred on “stack-on-core” and “stacked” designs only. All the cracks were located at the interface between the capture pad and the bottom of the microvia, where stress is the highest due to the CTE mismatch of different materials.


2014 ◽  
Vol 2014 (1) ◽  
pp. 000612-000617 ◽  
Author(s):  
Shota Miki ◽  
Takaharu Yamano ◽  
Sumihiro Ichikawa ◽  
Masaki Sanada ◽  
Masato Tanaka

In recent years, products such as smart phones, tablets, and wearable devices, are becoming miniaturized and high performance. 3D-type semiconductor structures are advancing as the demand for high-density assembly increases. We studied a fabrication process using a SoC die and a memory die for 3D-SiP (System in Package) with TSV technology. Our fabrication is comprised of two processes. One is called MEOL (Middle End of Line) for exposing and completing the TSV's in the SoC die, and the other is assembling the SoC and memory dice in a 3D stack. The TSV completion in MEOL was achieved by SoC wafer back-side processing. Because its final thickness will be a thin 50μm (typical), the SoC wafer (300 mm diameter) is temporarily attached face-down onto a carrier-wafer. Careful back-side grinding reveals the “blind vias” and fully opens them into TSV's. A passivation layer is then grown on the back of the wafer. With planarization techniques, the via metal is accessed and TSV pads are built by electro-less plating without photolithography. After the carrier-wafer is de-bonded, the thin wafer is sawed into dice. For assembling the 3D die stack, flip-chip technology by thermo-compression bonding was the method chosen. First, the SoC die with copper pillar bumps is assembled to the conventional organic substrate. Next the micro-bumps on the memory die are bonded to the TSV pads of the SoC die. Finally, the finished assembly is encapsulated and solder balls (BGA) are attached. The 3D-SiP has passed both package-level reliability and board-level reliability testing. These results show we achieved fabricating a 3D-SiP with high interconnect reliability.


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