A comparison of ALU structures for VLSI technology

1983 ◽  
Author(s):  
S. Ong ◽  
D. E. Atkins
Keyword(s):  
Vlsi Technology

Preparation of integrated chemical sensors using commercial VLSI technology

1987 ◽  
Vol 65 (5) ◽  
pp. 1072-1078 ◽  
Author(s):  
Paul G. Glavina ◽  
D. Jed Harrison
Keyword(s):  
Chemical Sensors ◽  
Linear Response ◽  
Field Effect ◽  
Field Effect Transistors ◽  
Microelectrode Arrays ◽  
Drain Current ◽  
Cyclic Voltammetric ◽  
Design Rules ◽  
Vlsi Technology ◽  
Commercial Technology

The fabrication of ion sensitive field effect transistors (ISFET) and microelectrode arrays for use as chemical sensors using a commercial CMOS fabrication process is described. The commercial technology is readily available through the Canadian Microelectronics Corporation; however, several of the recommended design rules must be ignored in preparing chemical sensors using this process. The ISFET devices show near theoretical response to K+ in aqueous solution (55 mV slope) when coated with a K+ sensitive membrane. An extended gate ion sensitive device is presented which offers advantages in encapsulation of ISFET sensors. The source-drain current of both devices show a linear response to log [Formula: see text] in contrast to ISFETs previously reported that have high internal lead resistances. Al and poly-Si microelectrode arrays are fabricated commercially and then Pt is electrodeposited on the microelectrodes. The resulting arrays show good cyclic voltammetric response to Fe(CN)64− and Ru(NH3)63+ and are relatively durable.

scholarly journals Material and process limits in silicon VLSI technology

2001 ◽  
Vol 89 (3) ◽  
pp. 240-258 ◽  
Author(s):  
J.D. Plummer ◽  
P.B. Griffin
Keyword(s):  
Vlsi Technology ◽  
Silicon Vlsi

1 µm MOSFET VLSI technology: Part II—Device designs and characteristics for high-performance logic applications

1979 ◽  
Vol 26 (4) ◽  
pp. 325-333 ◽  
Author(s):  
R.H. Dennard ◽  
F.H. Gaensslen ◽  
E.J. Walker ◽  
P.W. Cook
Keyword(s):  
High Performance ◽  
Vlsi Technology

The Design Of Scaleable Optical Crossbar Structures Using Felc/vlsi Technology And Free Space Optics

2005 ◽  
Author(s):  
M.J. Birch ◽  
W.A. Crossland ◽  
A.G. Kirk ◽  
T.J. Hall ◽  
D.G. Vass
Keyword(s):  
Free Space ◽  
Free Space Optics ◽  
Space Optics ◽  
Vlsi Technology
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