Modeling oxide thickness dependence of charging damage by plasma processing

1993 ◽  
Vol 14 (11) ◽  
pp. 509-511 ◽  
Author(s):  
H. Shin ◽  
K. Noguchi ◽  
C. Hu
Keyword(s):  
Plasma Processing ◽  
Oxide Thickness ◽  
Thickness Dependence

Oxide thickness dependence of energy shifts in the Si 2p levels for the SiO2/Si structure, and its elimination by a palladium overlayer

1998 ◽  
Vol 73 (7) ◽  
pp. 933-935 ◽  
Author(s):  
Hikaru Kobayashi ◽  
Tomohiro Kubota ◽  
Hidefumi Kawa ◽  
Yoshihiro Nakato ◽  
Masayoshi Nishiyama
Keyword(s):  
Oxide Thickness ◽  
Thickness Dependence

scholarly journals Oxide-thickness dependence of second harmonic generation from thick thermal oxides on Si(111)

1995 ◽  
Vol 331-333 ◽  
pp. 1367-1371 ◽  
Author(s):  
C.W. van Hasselt ◽  
E. Mateman ◽  
M.A.C. Devillers ◽  
Th. Rasing ◽  
A.A. Fedyanin ◽  
...  
Keyword(s):  
Second Harmonic Generation ◽  
Harmonic Generation ◽  
Second Harmonic ◽  
Oxide Thickness ◽  
Thickness Dependence

Study on Oxide Thickness Dependence of Current-Voltage Characteristics for HfOx Based ReRAM Device

2014 ◽  
Vol 64 (14) ◽  
pp. 93-98 ◽  
Author(s):  
Y. Hamada ◽  
S. Otsuka ◽  
T. Shimizu ◽  
S. Shingubara
Keyword(s):  
Oxide Thickness ◽  
Thickness Dependence ◽  
Current Voltage ◽  
Current Voltage Characteristics

Model for the oxide thickness dependence of SILC generation based on anode hole injection process

1999 ◽  
Vol 39 (6-7) ◽  
pp. 791-795 ◽  
Author(s):  
C. Jahan ◽  
S. Bruyère ◽  
G. Ghibaudo ◽  
E. Vincent ◽  
K. Barla
Keyword(s):  
Oxide Thickness ◽  
Thickness Dependence ◽  
Hole Injection ◽  
Injection Process ◽  
Anode Hole ◽  
Anode Hole Injection
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