AC-bias annealing effects on radiation-induced interface traps (MOS transistors)

1991 ◽  
Vol 38 (6) ◽  
pp. 1094-1100 ◽  
Author(s):  
M. Kato ◽  
K. Watanabe ◽  
T. Okabe
1996 ◽  
Vol 43 (6) ◽  
pp. 2547-2557 ◽  
Author(s):  
J.L. Autran ◽  
C. Chabrerie ◽  
P. Paillet ◽  
O. Flament ◽  
J.L. Leray ◽  
...  

2006 ◽  
Vol 527-529 ◽  
pp. 1063-1066 ◽  
Author(s):  
Ayayi Claude Ahyi ◽  
S.R. Wang ◽  
John R. Williams

The effects of gamma radiation on field effect mobility and threshold voltage have been studied for lateral n-channel 4H-SiC MOSFETs passivated with nitric oxide. MOS capacitors (n and p) and n-channel lateral MOSFETs were irradiated unbiased (floating contacts) for a total gamma dose of 6.8Mrad (Si). The MOS capacitors were used to study the radiation-induced interface traps and fixed oxide charge that affect the performance of the MOSFETs. Radiationinduced interface traps were observed near the SiC valence band edge and just above mid-gap, and field effect channel mobility was reduced by 18-20% following irradiation. Even so, 4HMOSFETs appear to be more radiation tolerant than Si devices.


1987 ◽  
Vol 50 (5) ◽  
pp. 242-244
Author(s):  
S. Buchner ◽  
M. Natan ◽  
K. Kang ◽  
D. Gill

1966 ◽  
Vol 13 (6) ◽  
pp. 273-281 ◽  
Author(s):  
W. J. Dennehy ◽  
G. J. Brucker ◽  
A. G. Holmes-Siedle

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