Conduction and charge trapping in polysilicon-silicon nitride-oxide-silicon structures under positive gate bias

1988 ◽  
Vol 35 (4) ◽  
pp. 459-467 ◽  
Author(s):  
M. Aminzadeh ◽  
S. Nozaki ◽  
R.V. Giridhar
Keyword(s):  
Silicon Nitride ◽  
Charge Trapping ◽  
Gate Bias ◽  
Silicon Structures ◽  
Nitride Oxide

scholarly journals Investigation of Intra-Nitride Charge Migration Suppression in SONOS Flash Memory

Micromachines ◽  
2019 ◽  
Vol 10 (6) ◽  
pp. 356 ◽  
Author(s):  
Seung-Dong Yang ◽  
Jun-Kyo Jung ◽  
Jae-Gab Lim ◽  
Seong-gye Park ◽  
Hi-Deok Lee ◽  
...  
Keyword(s):  
Silicon Nitride ◽  
Photoelectron Spectroscopy ◽  
Flash Memory ◽  
Silicon Oxide ◽  
Charge Trapping ◽  
Charge Migration ◽  
Charge Loss ◽  
Capacitance Voltage ◽  
Nitride Oxide ◽  
N2 Plasma

In order to suppress the intra-nitride charge spreading in 3D Silicon-Oxide-Nitride-Oxide-Silicon (SONOS) flash memory where the charge trapping layer silicon nitride is shared along the cell string, N2 plasma treated on the silicon nitride is proposed. Experimental results show that the charge loss decreased in the plasma treated device after baking at 300 °C for 2 h. To extract trap density according to the location in the trapping layer, capacitance-voltage analysis was used and N2 plasma treatment was shown to be effective to restrain the interface trap formation between blocking oxide and silicon nitride. Moreover, from X-ray Photoelectron Spectroscopy, the reduction of Si-O-N bonding was observed.

Influences of Processing Chemistry of Silicon Nitride Films on the Charge Trapping Behavior of Oxide/CVD‐Nitride/Oxide Capacitors

1988 ◽  
Vol 135 (3) ◽  
pp. 776-777 ◽  
Author(s):  
B. Y. Nguyen ◽  
P. J. Tobin ◽  
K. W. Teng ◽  
H. G. Tompkins ◽  
K. M. Chang
Keyword(s):  
Silicon Nitride ◽  
Charge Trapping ◽  
Silicon Nitride Films ◽  
Nitride Oxide

Investigating the degradation behavior caused by charge trapping effect under DC and AC gate-bias stress for InGaZnO thin film transistor

2011 ◽  
Vol 99 (2) ◽  
pp. 022104 ◽  
Author(s):  
Te-Chih Chen ◽  
Ting-Chang Chang ◽  
Tien-Yu Hsieh ◽  
Wei-Siang Lu ◽  
Fu-Yen Jian ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Film Transistor ◽  
Charge Trapping ◽  
Gate Bias ◽  
Degradation Behavior ◽  
Bias Stress ◽  
Trapping Effect ◽  
Gate Bias Stress

Effect of Silicon Nitride/Oxide on the Structure and the Thermal Conductivity of CoSi Nanocomposites

2017 ◽  
Vol 17 (3) ◽  
pp. 1555-1563
Author(s):  
Maria Ioannou ◽  
Andreas Delimitis ◽  
Elli Symeou ◽  
John Giapintzakis ◽  
Theodora Kyratsi
Keyword(s):  
Thermal Conductivity ◽  
Silicon Nitride ◽  
Nitride Oxide
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