scholarly journals Effects of a chirped bias voltage on ion energy distributions in inductively coupled plasma reactors

2017 ◽  
Vol 122 (8) ◽  
pp. 083301 ◽  
Author(s):  
Steven J. Lanham ◽  
Mark J. Kushner
Keyword(s):  
Bias Voltage ◽  
Inductively Coupled Plasma ◽  
Plasma Reactors ◽  
Energy Distributions ◽  
Ion Energy ◽  
Inductively Coupled ◽  
Ion Energy Distributions

scholarly journals Ion energy distributions in inductively coupled plasmas having a biased boundary electrode

2012 ◽  
Vol 21 (6) ◽  
pp. 065009 ◽  
Author(s):  
Michael D Logue ◽  
Hyungjoo Shin ◽  
Weiye Zhu ◽  
Lin Xu ◽  
Vincent M Donnelly ◽  
...  
Keyword(s):  
Inductively Coupled Plasmas ◽  
Energy Distributions ◽  
Ion Energy ◽  
Inductively Coupled ◽  
Ion Energy Distributions ◽  
Coupled Plasmas

scholarly journals Factors influencing ion energy distributions in pulsed inductively coupled argon plasmas

2020 ◽  
Vol 53 (33) ◽  
pp. 335202
Author(s):  
Zhiying Chen ◽  
Roberto C Longo ◽  
Michael Hummel ◽  
Megan Carruth ◽  
Joel Blakeney ◽  
...  
Keyword(s):  
Energy Distributions ◽  
Ion Energy ◽  
Inductively Coupled ◽  
Argon Plasmas ◽  
Factors Influencing ◽  
Ion Energy Distributions

Plasma Diagnostics and the Evolution of a Novel Titanium Nitride Deposition Process

2001 ◽  
Vol 672 ◽  
Author(s):  
Chris Muratore ◽  
John J. Moore ◽  
J. Alan Rees ◽  
Dan Carter ◽  
Greg Roche
Keyword(s):  
Titanium Nitride ◽  
Deposition Rate ◽  
Inductively Coupled Plasma ◽  
Film Growth ◽  
Deposition Process ◽  
Inert Gas ◽  
Energy Distributions ◽  
Ion Energy ◽  
Nitrogen Ion ◽  
Ion Energy Distributions

ABSTRACTMeasurement of the ion energy distributions (IED's) of N2+ ions produced in an inductively coupled plasma (ICP) source revealed that adding argon to the nitrogen gas before excitation in the source increased the nitrogen ion current. Adding helium resulted in an increase of the most probable ion energy, and a higher-energy component of the N2+ IED at about 20 eV. Preliminary calculations of the electron energy distributions (EED's) correlate well to the IED's for both inert gas additions. Experiments were performed to determine the effect of these modified energy distributions of the reactive species on titanium nitride thin film growth rates, microstructure and mechanical properties. Deposition experiments were conducted using the ICP source and an unbalanced magnetron with a titanium cathode. Results showed that the argon inert gas addition resulted in increased deposition rate and reduced 3-D features. Film roughness was decreased to 1.61 nm from 2.05 nm when helium was mixed with the nitrogen. Mixing both argon and helium with the nitrogen yielded combined effects of deposition rate increase, reduced 3-D features and increased smoothness. The inert gas additions increased hardness of the TiN films from 17.3 GPa to 21.1 GPa with the argon addition and to 25.0 GPa with the helium addition

scholarly journals Dependence of Ar+ and Ti+ Ion Energy Distributions on Ar Pressure in Inductively Coupled rf Plasma Enhanced Magnetron Sputtering.

Shinku ◽  
1999 ◽  
Vol 42 (3) ◽  
pp. 413-416
Author(s):  
Suguru SAIKI ◽  
Takayoshi SAITO ◽  
Toshiki KOBAYASHI ◽  
Kazuhiro FUKUSHIMA ◽  
Naoto KIKUCHI ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Rf Plasma ◽  
Energy Distributions ◽  
Ion Energy ◽  
Inductively Coupled ◽  
Ion Energy Distributions
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