scholarly journals Dependence of Ar+ and Ti+ Ion Energy Distributions on Ar Pressure in Inductively Coupled rf Plasma Enhanced Magnetron Sputtering.

Shinku ◽  
1999 ◽  
Vol 42 (3) ◽  
pp. 413-416
Author(s):  
Suguru SAIKI ◽  
Takayoshi SAITO ◽  
Toshiki KOBAYASHI ◽  
Kazuhiro FUKUSHIMA ◽  
Naoto KIKUCHI ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Rf Plasma ◽  
Energy Distributions ◽  
Ion Energy ◽  
Inductively Coupled ◽  
Ion Energy Distributions

The ion energy distributions and ion flux composition from a high power impulse magnetron sputtering discharge

2006 ◽  
Vol 515 (4) ◽  
pp. 1522-1526 ◽  
Author(s):  
J. Bohlmark ◽  
M. Lattemann ◽  
J.T. Gudmundsson ◽  
A.P. Ehiasarian ◽  
Y. Aranda Gonzalvo ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
High Power ◽  
Ion Flux ◽  
Energy Distributions ◽  
Ion Energy ◽  
Flux Composition ◽  
Ion Energy Distributions

scholarly journals Ion energy distributions in inductively coupled plasmas having a biased boundary electrode

2012 ◽  
Vol 21 (6) ◽  
pp. 065009 ◽  
Author(s):  
Michael D Logue ◽  
Hyungjoo Shin ◽  
Weiye Zhu ◽  
Lin Xu ◽  
Vincent M Donnelly ◽  
...  
Keyword(s):  
Inductively Coupled Plasmas ◽  
Energy Distributions ◽  
Ion Energy ◽  
Inductively Coupled ◽  
Ion Energy Distributions ◽  
Coupled Plasmas

scholarly journals Ion Energy Distribution during Magnetron Sputtering Enhanced with an Inductively Coupled rf Plasma.

Shinku ◽  
1998 ◽  
Vol 41 (3) ◽  
pp. 147-150 ◽  
Author(s):  
Masamichi MATSUURA ◽  
Tadashi YAMAMOTO ◽  
Tadashi MORITA ◽  
Toshiharu KURAUCHI
Keyword(s):  
Magnetron Sputtering ◽  
Energy Distribution ◽  
Rf Plasma ◽  
Ion Energy ◽  
Ion Energy Distribution ◽  
Inductively Coupled

scholarly journals Factors influencing ion energy distributions in pulsed inductively coupled argon plasmas

2020 ◽  
Vol 53 (33) ◽  
pp. 335202
Author(s):  
Zhiying Chen ◽  
Roberto C Longo ◽  
Michael Hummel ◽  
Megan Carruth ◽  
Joel Blakeney ◽  
...  
Keyword(s):  
Energy Distributions ◽  
Ion Energy ◽  
Inductively Coupled ◽  
Argon Plasmas ◽  
Factors Influencing ◽  
Ion Energy Distributions

scholarly journals Dependence of Ar+ and Ti+ Ion Energy Distribution on dc Self Bias of the rf Inductive Coil in Inductively-coupled rf Plasma Enhanced Magnetron Sputtering.

Shinku ◽  
1999 ◽  
Vol 42 (3) ◽  
pp. 409-412
Author(s):  
Takayoshi SAITOH ◽  
Suguru SAIKI ◽  
Toshiki KOBAYASHI ◽  
Kazuhiro FUKUSHIMA ◽  
Naoto KIKUCHI ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Energy Distribution ◽  
Rf Plasma ◽  
Ion Energy ◽  
Ion Energy Distribution ◽  
Inductively Coupled ◽  
Self Bias
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