Enhanced light extraction of scintillator using large-area photonic crystal structures fabricated by soft-X-ray interference lithography

2015 ◽  
Vol 106 (24) ◽  
pp. 241901 ◽  
Author(s):  
Zhichao Zhu ◽  
Shuang Wu ◽  
Chaofan Xue ◽  
Jun Zhao ◽  
Liansheng Wang ◽  
...  
2021 ◽  
Vol 11 (14) ◽  
pp. 6559
Author(s):  
Hongsub Jee ◽  
Min-Joon Park ◽  
Kiseok Jeon ◽  
Chaehwan Jeong ◽  
Jaehyeong Lee

Interference lithography is a promising method for fabricating large-area, defect-free three-dimensional photonic crystal structures which can be used for facilitating the realization of photonic devices with a fast processing time. Although they can be used in waveguides, resonators, and detectors, their repeated regular array patterns can only be used for limited applications. In this study, we demonstrate a method for fabricating large-area photonic crystal structures with controlled defects by combining interference lithography and two-photon lithography using a light-curable resin. By combining regular array structures and controlled patterns, monotonous but large-area regular structures can be obtained. Furthermore, the patterned structures have considerable potential for use in various applications, such as solar cells, sensors, photodetectors, micro-/nano-electronics, and cell growth.


2018 ◽  
Vol 26 (9) ◽  
pp. 11438 ◽  
Author(s):  
Xueye Chen ◽  
Bo Liu ◽  
Qiang Wu ◽  
Zhichao Zhu ◽  
Jingtao Zhu ◽  
...  

Author(s):  
Neilanjan Dutta ◽  
Peng Yao ◽  
Shouyuan Shi ◽  
Ahmed Sharkawy ◽  
Ozgenc Ebil ◽  
...  

2005 ◽  
Vol 81 (2-3) ◽  
pp. 271-275 ◽  
Author(s):  
H. C. Guo ◽  
D. Nau ◽  
A. Radke ◽  
X. P. Zhang ◽  
J. Stodolka ◽  
...  

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