Contrast in Multi-Beam-Interference Lithography for the Fabrication of Photonic Crystal Structures

Author(s):  
Justin L. Stay ◽  
Andrew T. Heidt ◽  
Thomas K. Gaylord
2012 ◽  
Vol 51 (18) ◽  
pp. 4028 ◽  
Author(s):  
Guy M. Burrow ◽  
Matthieu C. R. Leibovici ◽  
Thomas K. Gaylord

2021 ◽  
Vol 11 (14) ◽  
pp. 6559
Author(s):  
Hongsub Jee ◽  
Min-Joon Park ◽  
Kiseok Jeon ◽  
Chaehwan Jeong ◽  
Jaehyeong Lee

Interference lithography is a promising method for fabricating large-area, defect-free three-dimensional photonic crystal structures which can be used for facilitating the realization of photonic devices with a fast processing time. Although they can be used in waveguides, resonators, and detectors, their repeated regular array patterns can only be used for limited applications. In this study, we demonstrate a method for fabricating large-area photonic crystal structures with controlled defects by combining interference lithography and two-photon lithography using a light-curable resin. By combining regular array structures and controlled patterns, monotonous but large-area regular structures can be obtained. Furthermore, the patterned structures have considerable potential for use in various applications, such as solar cells, sensors, photodetectors, micro-/nano-electronics, and cell growth.


2015 ◽  
Vol 106 (24) ◽  
pp. 241901 ◽  
Author(s):  
Zhichao Zhu ◽  
Shuang Wu ◽  
Chaofan Xue ◽  
Jun Zhao ◽  
Liansheng Wang ◽  
...  

2003 ◽  
Vol 82 (11) ◽  
pp. 1667-1669 ◽  
Author(s):  
Ivan Divliansky ◽  
Theresa S. Mayer ◽  
Kito S. Holliday ◽  
Vincent H. Crespi

2012 ◽  
Vol 51 (5) ◽  
pp. 568 ◽  
Author(s):  
F. Hosseinibalam ◽  
S. Hassanzadeh ◽  
A. Ebnali-Heidari ◽  
C. Karnutsch

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