Fabrication of Large Area “Woodpile” Photonic Crystal Structures for Near IR

Author(s):  
Neilanjan Dutta ◽  
Peng Yao ◽  
Shouyuan Shi ◽  
Ahmed Sharkawy ◽  
Ozgenc Ebil ◽  
...  
2006 ◽  
Vol 939 ◽  
Author(s):  
Yun-Ju Lee ◽  
Ganapathi Subramania ◽  
Bernadette A. Hernandez-Sanchez ◽  
Michael K. Niehaus ◽  
Timothy J. Boyle ◽  
...  

ABSTRACTWe demonstrate the functionalization of 2-D photonic crystal structures operating at ∼ 1.5 μm with colloidal PbSe quantum dots and examine the modified photoluminescence from the functionalized photonic crystal. Using spin coating and airbrushing, monodisperse PbSe quantum dots were deposited from hexanes on lithographically patterned GaAs photonic crystal substrates. The effectiveness of patterning the PbSe quantum dots via standard liftoff process was examined. The near-IR photoluminescence spectra of quantum dot-functionalized photonic crystals were studied. We found that the photoluminescence peak became attenuated by approximately a factor of five and exhibited a narrow peak width (50 nm vs. 120 nm) compared to PbSe deposited on unpatterned GaAs, suggesting that there is some coupling between the quantum dots and the photonic crystal. Future work to improve the coupling and detection efficiency is proposed.


2021 ◽  
Vol 11 (14) ◽  
pp. 6559
Author(s):  
Hongsub Jee ◽  
Min-Joon Park ◽  
Kiseok Jeon ◽  
Chaehwan Jeong ◽  
Jaehyeong Lee

Interference lithography is a promising method for fabricating large-area, defect-free three-dimensional photonic crystal structures which can be used for facilitating the realization of photonic devices with a fast processing time. Although they can be used in waveguides, resonators, and detectors, their repeated regular array patterns can only be used for limited applications. In this study, we demonstrate a method for fabricating large-area photonic crystal structures with controlled defects by combining interference lithography and two-photon lithography using a light-curable resin. By combining regular array structures and controlled patterns, monotonous but large-area regular structures can be obtained. Furthermore, the patterned structures have considerable potential for use in various applications, such as solar cells, sensors, photodetectors, micro-/nano-electronics, and cell growth.


2015 ◽  
Vol 106 (24) ◽  
pp. 241901 ◽  
Author(s):  
Zhichao Zhu ◽  
Shuang Wu ◽  
Chaofan Xue ◽  
Jun Zhao ◽  
Liansheng Wang ◽  
...  

2018 ◽  
Vol 26 (9) ◽  
pp. 11438 ◽  
Author(s):  
Xueye Chen ◽  
Bo Liu ◽  
Qiang Wu ◽  
Zhichao Zhu ◽  
Jingtao Zhu ◽  
...  

2012 ◽  
Vol 51 (5) ◽  
pp. 568 ◽  
Author(s):  
F. Hosseinibalam ◽  
S. Hassanzadeh ◽  
A. Ebnali-Heidari ◽  
C. Karnutsch

2011 ◽  
Vol 36 (6) ◽  
pp. 984 ◽  
Author(s):  
Wei-Cheng Lai ◽  
Swapnajit Chakravarty ◽  
Xiaolong Wang ◽  
Cheyun Lin ◽  
Ray T. Chen

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