Studies of atomic oxygen in O2+CF4 rf discharges by two‐photon laser‐induced fluorescence and optical emission spectroscopy

1986 ◽  
Vol 84 (5) ◽  
pp. 2668-2674 ◽  
Author(s):  
R. E. Walkup ◽  
K. L. Saenger ◽  
G. S. Selwyn
Keyword(s):  
Emission Spectroscopy ◽  
Atomic Oxygen ◽  
Optical Emission Spectroscopy ◽  
Optical Emission ◽  
Laser Induced Fluorescence ◽  
Two Photon ◽  
Rf Discharges

Quantitative Studies of Glow-Discharge Deposition Using Optical Emission Spectroscopy

1984 ◽  
Vol 38 ◽  
Author(s):  
F. J. Kampas
Keyword(s):  
Electrical Properties ◽  
Glow Discharge ◽  
Emission Spectroscopy ◽  
Optical Emission Spectroscopy ◽  
Optical Emission ◽  
Secondary Electrons ◽  
Rf Discharges ◽  
Quantitative Studies ◽  
Glow Discharge Deposition

AbstractIntensities of CH optical emission and electrical properties of methane rf discharges as a function of pressure are presented and discussed. The results are consistent with a model in which the properties of the discharge are dominated by secondary electrons traversing the gap between the electrodes.

Reactive Sputtiering in Oxidizing/Reducing Atmospheres

1993 ◽  
Vol 324 ◽  
Author(s):  
J. D. Klein ◽  
A. Yen ◽  
S. L. Clauson
Keyword(s):  
Emission Spectroscopy ◽  
Atomic Oxygen ◽  
Redox State ◽  
Optical Emission Spectroscopy ◽  
Rf Sputtering ◽  
Optical Emission ◽  
Gas Mixture ◽  
Dc Sputtering ◽  
Chamber Gas

AbstractThe deposition of thin films by magnetron sputtering is readily influenced by the reduction/oxidation characteristics of the plasma. Unfortunately, the redox state of the sputter plasma is often inadvertently determined by uncontrolled factors such as transient evolution of species from the target. Undesirable variations in film and target properties can be avoided by actively setting the redox conditions. This is most readily accomplished by including two competing species, one oxidizing and the other reducing, in the chamber gas mixture. Optical emission spectroscopy, an in-situ process monitor, was employed to observe redox interactions in nominally unreactive dc sputtering of YBCO and reactive rf sputtering of IrO2. Optical spectroscopy of YBCO sputtering reveals that the intensity of atomic oxygen emissions decreases with H2 additions to the sputter gas blend.

Spatial Generation Profiles of Active Radicals in Plasma-Enhanced CVD Of a-Si:H

1989 ◽  
Vol 165 ◽  
Author(s):  
D. Mataras ◽  
S. Cavadias ◽  
D. Rapakoulias
Keyword(s):  
Excited States ◽  
Ground State ◽  
Emission Spectroscopy ◽  
Optical Emission Spectroscopy ◽  
Simultaneous Detection ◽  
Optical Emission ◽  
Laser Induced Fluorescence ◽  
Plasma Enhanced Cvd ◽  
Spatially Resolved ◽  
Kinetic Calculations

AbstractSpatially resolved Laser Induced Fluorescence and Optical Emission Spectroscopy were applied in an rf silane discharge, for the simultaneous detection of both ground and excited states of SiH radicals. Axial intensity profiles of these radicals were recorded under various conditions. The experimental observations indicate that the two radicals have different generation paths. LIF profiles are considered to represent the generation profile of all the ground state radicals and they were used as such in kinetic calculations.

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