Electrical characteristics and hydrogen concentration of chemical vapor deposited silicon dioxide films: Effect of water treatment

1992 ◽  
Vol 72 (9) ◽  
pp. 4214-4219 ◽  
Author(s):  
S. C. Li ◽  
S. P. Murarka
Keyword(s):  
Water Treatment ◽  
Silicon Dioxide ◽  
Hydrogen Concentration ◽  
Chemical Vapor ◽  
Electrical Characteristics ◽  
Effect Of Water ◽  
Silicon Dioxide Films ◽  
Chemical Vapor Deposited

Improving stress stability in low-pressure chemical vapor deposited silicon dioxide films by ion implantation

2016 ◽  
Vol 598 ◽  
pp. 103-108 ◽  
Author(s):  
Haiping Shang ◽  
Jianyu Fu ◽  
Changqing Xie ◽  
Zhigang Li ◽  
Dapeng Chen
Keyword(s):  
Ion Implantation ◽  
Silicon Dioxide ◽  
Chemical Vapor ◽  
Low Pressure ◽  
Silicon Dioxide Films ◽  
Chemical Vapor Deposited ◽  
Pressure Chemical
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