29Si hyperfine spectra and structure ofE’ dangling‐bond defects in plasma‐enhanced chemical‐vapor deposited silicon dioxide films on silicon

1989 ◽  
Vol 66 (11) ◽  
pp. 5488-5491 ◽  
Author(s):  
W. L. Warren ◽  
P. M. Lenahan
Keyword(s):  
Silicon Dioxide ◽  
Chemical Vapor ◽  
Dangling Bond ◽  
Silicon Dioxide Films ◽  
Chemical Vapor Deposited

Improving stress stability in low-pressure chemical vapor deposited silicon dioxide films by ion implantation

2016 ◽  
Vol 598 ◽  
pp. 103-108 ◽  
Author(s):  
Haiping Shang ◽  
Jianyu Fu ◽  
Changqing Xie ◽  
Zhigang Li ◽  
Dapeng Chen
Keyword(s):  
Ion Implantation ◽  
Silicon Dioxide ◽  
Chemical Vapor ◽  
Low Pressure ◽  
Silicon Dioxide Films ◽  
Chemical Vapor Deposited ◽  
Pressure Chemical
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