Trapped positive charge in plasma‐enhanced chemical vapor deposited silicon dioxide films

1990 ◽  
Vol 56 (11) ◽  
pp. 1037-1039 ◽  
Author(s):  
D. A. Buchanan ◽  
J. H. Stathis ◽  
P. R. Wagner
Keyword(s):  
Silicon Dioxide ◽  
Positive Charge ◽  
Chemical Vapor ◽  
Silicon Dioxide Films ◽  
Chemical Vapor Deposited

Improving stress stability in low-pressure chemical vapor deposited silicon dioxide films by ion implantation

2016 ◽  
Vol 598 ◽  
pp. 103-108 ◽  
Author(s):  
Haiping Shang ◽  
Jianyu Fu ◽  
Changqing Xie ◽  
Zhigang Li ◽  
Dapeng Chen
Keyword(s):  
Ion Implantation ◽  
Silicon Dioxide ◽  
Chemical Vapor ◽  
Low Pressure ◽  
Silicon Dioxide Films ◽  
Chemical Vapor Deposited ◽  
Pressure Chemical
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