Spectroscopic ellipsometry study of hydrogenated amorphous silicon carbon alloy films deposited by plasma enhanced chemical vapor deposition

D. K. Basa; G. Abbate; G. Ambrosone; U. Coscia; A. Marino

doi:10.1063/1.3277016

Spectroscopic ellipsometry study of hydrogenated amorphous silicon carbon alloy films deposited by plasma enhanced chemical vapor deposition

Journal of Applied Physics ◽

10.1063/1.3277016 ◽

2010 ◽

Vol 107 (2) ◽

pp. 023502 ◽

Cited By ~ 18

Author(s):

D. K. Basa ◽

G. Abbate ◽

G. Ambrosone ◽

U. Coscia ◽

A. Marino

Keyword(s):

Chemical Vapor Deposition ◽

Amorphous Silicon ◽

Spectroscopic Ellipsometry ◽

Vapor Deposition ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapor ◽

Alloy Films ◽

Silicon Carbon ◽

Hydrogenated Amorphous

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Nucleation and growth of hydrogenated amorphous silicon‐carbon alloys: Effect of hydrogen dilution in plasma‐enhanced chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.110535 ◽

1993 ◽

Vol 63 (16) ◽

pp. 2228-2230 ◽

Cited By ~ 12

Author(s):

Yiwei Lu ◽

Ilsin An ◽

M. Gunes ◽

M. Wakagi ◽

C. R. Wronski ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapor ◽

Nucleation And Growth ◽

Hydrogen Dilution ◽

Silicon Carbon ◽

Hydrogenated Amorphous

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Spectroscopic Ellipsometry Studies on Ultrathin Hydrogenated Amorphous Silicon Films Prepared by Thermal Chemical Vapor Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.39.6196 ◽

2000 ◽

Vol 39 (Part 1, No. 11) ◽

pp. 6196-6201 ◽

Cited By ~ 3

Author(s):

Sukti Hazra ◽

Mitsuyuki Yamanaka ◽

Isao Sakata ◽

Toshiyuki Tsutsumi ◽

Tatsuro Maeda ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Amorphous Silicon ◽

Spectroscopic Ellipsometry ◽

Vapor Deposition ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapor ◽

Silicon Films ◽

Thermal Chemical Vapor Deposition ◽

Hydrogenated Amorphous

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Spectroscopic ellipsometry studies on hydrogenated amorphous silicon thin films deposited using DC saddle field plasma enhanced chemical vapor deposition system

Thin Solid Films ◽

10.1016/j.tsf.2010.12.074 ◽

2011 ◽

Vol 519 (9) ◽

pp. 2863-2866 ◽

Cited By ~ 9

Author(s):

Jhantu Kumar Saha ◽

Barzin Bahardoust ◽

Keith Leong ◽

Adel B. Gougam ◽

Nazir P. Kherani ◽

...

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Amorphous Silicon ◽

Spectroscopic Ellipsometry ◽

Vapor Deposition ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapor ◽

Silicon Thin Films ◽

Dc Saddle Field ◽

Hydrogenated Amorphous

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In situ optical diagnosis on hydrogenated amorphous silicon grown by vibration superimposed plasma chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.114284 ◽

1995 ◽

Vol 66 (9) ◽

pp. 1071-1073 ◽

Cited By ~ 5

Author(s):

Nobuo Naito ◽

Akihiro Takano ◽

Masatomo Sumiya ◽

Masashi Kawasaki ◽

Hideomi Koinuma

Keyword(s):

Chemical Vapor Deposition ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapor ◽

Optical Diagnosis ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Hydrogenated Amorphous

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X‐ray photoelectron spectroscopy analysis of photostimulated chemical vapor deposition hydrogenated amorphous silicon/amorphous aluminum oxide

Applied Physics Letters ◽

10.1063/1.107407 ◽

1992 ◽

Vol 60 (10) ◽

pp. 1208-1210 ◽

Cited By ~ 1

Author(s):

K. Uwasawa ◽

F. Ishihara ◽

S. Matsumoto

Keyword(s):

Chemical Vapor Deposition ◽

Aluminum Oxide ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Photoelectron Spectroscopy ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapor ◽

Spectroscopy Analysis ◽

X Ray ◽

Hydrogenated Amorphous

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Effects of silicon–hydrogen bond characteristics on the crystallization of hydrogenated amorphous silicon films prepared by plasma enhanced chemical vapor deposition

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.582049 ◽

1999 ◽

Vol 17 (6) ◽

pp. 3240-3245 ◽

Cited By ~ 21

Author(s):

Hae-Yeol Kim ◽

Jae-Beom Choi ◽

Jai-Young Lee

Keyword(s):

Hydrogen Bond ◽

Chemical Vapor Deposition ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapor ◽

Silicon Films ◽

Hydrogenated Amorphous ◽

Bond Characteristics

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Influence of RF Bias on Hydrogenated Amorphous Silicon by High-Density Plasma Chemical Vapor Deposition

Journal of The Electrochemical Society ◽

10.1149/1.2713723 ◽

2007 ◽

Vol 154 (5) ◽

pp. G122 ◽

Cited By ~ 9

Author(s):

Wen-Chu Hsiao ◽

Chuan-Pu Liu ◽

Ying-Lang Wang

Keyword(s):

Chemical Vapor Deposition ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapor ◽

High Density ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Hydrogenated Amorphous ◽

Density Plasma

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Preparation of Hydrogenated Amorphous Silicon Carbon Nitride Films by Hot-Wire Chemical Vapor Deposition Using Hexamethyldisilazane for Silicon Solar Cell Applications

Japanese Journal of Applied Physics ◽

10.1143/jjap.46.56 ◽

2007 ◽

Vol 46 (1) ◽

pp. 56-59 ◽

Cited By ~ 4

Author(s):

Amornrat Limmanee ◽

Michio Otsubo ◽

Takehiko Sato ◽

Shinsuke Miyajima ◽

Akira Yamada ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Solar Cell ◽

Vapor Deposition ◽

Carbon Nitride ◽

Silicon Solar Cell ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapor ◽

Hot Wire ◽

Silicon Carbon ◽

Hydrogenated Amorphous

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Thermal properties of hydrogenated amorphous silicon prepared by high-density plasma chemical vapor deposition

Journal of Physics and Chemistry of Solids ◽

10.1016/j.jpcs.2007.07.095 ◽

2008 ◽

Vol 69 (2-3) ◽

pp. 648-652 ◽

Cited By ~ 4

Author(s):

Wen-Chu Hsiao ◽

Chuan-Pu Liu ◽

Ying-Lang Wang

Keyword(s):

Thermal Properties ◽

Chemical Vapor Deposition ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Hydrogenated Amorphous ◽

Density Plasma

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Hydrogenated amorphous silicon carbide deposition using electron cyclotron resonance chemical vapor deposition under high microwave power and strong hydrogen dilution

Journal of Applied Physics ◽

10.1063/1.1500418 ◽

2002 ◽

Vol 92 (5) ◽

pp. 2937-2941 ◽

Cited By ~ 41

Author(s):

K. Chew ◽

Rusli ◽

S. F. Yoon ◽

J. Ahn ◽

V. Ligatchev ◽

...

Keyword(s):

Silicon Carbide ◽

Chemical Vapor Deposition ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapor ◽

Hydrogen Dilution ◽

Hydrogenated Amorphous

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